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The formation of hydrogen blisters in the fabrication of tunnelling oxide passivating contact (TOPCon) solar cells critically degrades passivation. In this study, we investigated the formation mechanism of blisters during the fabrication of TOPCons for crystalline silicon solar cells and the suppression of such blisters. We tested the effects of annealing temperature and duration, surface roughness, and deposition temperature on the blister formation, which was suppressed in two ways. First, TOPCon fabrication on a rough surface enhanced adhesion force, resulting in reduced blister formation after thermal annealing. Second, deposition or annealing at higher temperatures resulted in the reduction of hydrogen in the film. A sample fabricated through low-pressure chemical vapor deposition at 580 °C was free from silicon–hydrogen bonds and blisters after the TOPCon structure was annealed. Remarkably, samples after plasma-enhanced chemical vapor deposition at 300, 370, and 450 °C were already blistered in the as-deposited state, despite low hydrogen contents. Analysis of the hydrogen incorporation, microstructure, and deposition mechanism indicate that in plasma-enhanced chemical vapor deposition (PECVD) deposition, although the increase of substrate temperature reduces the hydrogen content, it risks the increase of porosity and molecular-hydrogen trapping, resulting in even more severe blistering.

We report on the structural evolution of tunneling oxide passivating contact (TOPCon) for high efficient solar cells upon thermal annealing. The evolution of doped hydrogenated amorphous silicon (a-Si:H) into polycrystalline-silicon (poly-Si) by thermal annealing was accompanied with significant structural changes. Annealing at 600 °C for one minute introduced an increase in the implied open circuit voltage (V oc ) due to the hydrogen motion, but the implied V oc decreased again at 600 °C for five minutes. At annealing temperature above 800 °C, a-Si:H crystallized and formed poly-Si and thickness of tunneling oxide slightly decreased. The thickness of the interface tunneling oxide gradually decreased and the pinholes are formed through the tunneling oxide at a higher annealing temperature up to 1000 °C, which introduced the deteriorated carrier selectivity of the TOPCon structure. Our results indicate a correlation between the structural evolution of the TOPCon passivating contact and its passivation property at different stages of structural transition from the a-Si:H to the poly-Si as well as changes in the thickness profile of the tunneling oxide upon thermal annealing. Our result suggests that there is an optimum thickness of the tunneling oxide for passivating electron contact, in a range between 1.2 to 1.5 nm.

Tunnel oxide passivated contacts (TOPCon) embedding a thin oxide layer between polysilicon and base crystalline silicon have shown great potential in the development of solar cells with high conversion efficiency. In this study, we investigate the formation mechanism of hole-carrier selective contacts with TOPCon structure on n-type crystalline silicon wafers. We explore the thermal annealing effects on the passivation properties in terms of the stability of the thermally-formed silicon oxide layer and the deposition conditions of boron-doped polysilicon. To understand the underlying principle of the passivation properties, the active dopant in-diffusion profiles following the thermal annealing are investigated, combined with an analysis of the microscopic structure. Based on PC1D simulation, we find that shallow in-diffusion of boron across a robust tunnel oxide forms a p–n junction and improves the passivation properties. Our findings can provide a pathway to understanding and designing high-quality hole-selective contacts based on the TOPCon structure for the development of highly efficient crystalline silicon solar cells.

Since the temperature of a photovoltaic (PV) module is not consistent as it was estimated at a standard test condition, the thermal stability of the solar cell parameters determines the temperature dependence of the PV module. Fill factor loss analysis of crystalline silicon solar cell is one of the most efficient methods to diagnose the dominant problem, accurately. In this study, the fill factor analysis method and the double-diode model of a solar cell was applied to analyze the effect of J01, J02, Rs, and Rsh on the fill factor in details. The temperature dependence of the parameters was compared through the passivated emitter rear cell (PERC) of the industrial scale solar cells. As a result of analysis, PERC cells showed different temperature dependence for the fill factor loss of the J01 and J02 as temperatures rose. In addition, we confirmed that fill factor loss from the J01 and J02 at elevated temperature depends on the initial state of the solar cells. The verification of the fill factor loss analysis was conducted by comparing to the fitting results of the injection dependent-carrier lifetime.

In this study, we demonstrated the enhancement of the output power of a hybrid energy device (HED) using a cooling patch that does not consume any external electric power. The HED consisted of a photovoltaic cell (PVC) and a thermoelectric generator (TEG); the cooling patch was attached to the TEG. When the PVC was exposed to solar irradiance, the cooling patch lowered the temperature of the PVC and increased the thermal gradient across the TEG, thereby increasing the output power. For an HED with a cooling patch at an irradiance of 1000 W/m2, the output power increased to 24.2 mW, as compared to the output power of 19.9 mW for an HED without any cooling patch.

In the fabrication of crystalline silicon solar cells, the contact properties between the front metal electrode and silicon are one of the most important parameters for achieving high-efficiency, as it is an integral element in the formation of solar cell electrodes. This entails an increase in the surface recombination velocity and a drop in the open-circuit voltage of the solar cell; hence, controlling the recombination velocity at the metal-silicon interface becomes a critical factor in the process. In this study, the distribution of Ag crystallites formed on the silicon-metal interface, the surface recombination velocity in the silicon-metal interface and the resulting changes in the performance of the Passivated Emitter and Rear Contact (PERC) solar cells were analyzed by controlling the firing temperature. The Ag crystallite distribution gradually increased corresponding to a firing temperature increase from 850 ∘C to 950 ∘C. The surface recombination velocity at the silicon-metal interface increased from 353 to 599 cm/s and the open-circuit voltage of the PERC solar cell decreased from 659.7 to 647 mV. Technology Computer-Aided Design (TCAD) simulation was used for detailed analysis on the effect of the surface recombination velocity at the silicon-metal interface on the PERC solar cell performance. Simulations showed that the increase in the distribution of Ag crystallites and surface recombination velocity at the silicon-metal interface played an important role in the decrease of open-circuit voltage of the PERC solar cell at temperatures of 850–900 ∘C, whereas the damage caused by the emitter over fire was determined as the main cause of the voltage drop at 950 ∘C. These results are expected to serve as a steppingstone for further research on improvement in the silicon-metal interface properties of silicon-based solar cells and investigation on high-efficiency solar cells.

Quaternary perovskite solar cells are being extensively studied, with the goal of increasing solar cell efficiency and securing stability by changing the ratios of methylammonium, formamidinium, I3, and Br3. However, when the stoichiometric ratio is changed, the photoelectric properties reflect those of different materials, making it difficult to study the physical properties of the quaternary perovskite. In this study, the optical properties of perovskite materials with various stoichiometric ratios were measured using ellipsometry, and the results were analyzed using an optical simulation model. Because it is difficult to analyze the spectral pattern according to composition using the existing method of statistical regression analysis, an artificial neural network (ANN) structure was constructed to enable the hyperregression analysis of n-dimensional variables. Finally, by inputting the stoichiometric ratios used in the fabrication and the wavelength range to the trained artificial intelligence model, it was confirmed that the optical properties were similar to those measured with an ellipsometer. The refractive index and extinction coefficient extracted through the ellipsometry analysis show a tendency consistent with the color change of the specimen, and have a similar shape to that reported in the literature. When the optical properties of the unmodified perovskite are predicted using the verified artificial intelligence model, a very complex change in pattern is observed, which is impossible to analyze with a general regression method. It can be seen that this change in optical properties is well maintained, even during rapid variations in the pattern according to the change in composition. In conclusion, hyperregression analysis with n-dimensional variables can be performed for the spectral patterns of thin-film materials using a simple big data construction method.

The silicon wafers for solar cells on which the paste is deposited experience a bowing phenomenon. The thickness of commonly used c-Si wafers is 180 μm or more. When fabricating c-Si solar cells with this wafer thickness, the bowing value is 3 mm or less and the problem does not occur. However, for the thin c-Si solar cells which are being studied recently, the output reduction due to failure during manufacture and cracking are attributed to bowing. In generally, it is known that the bowing phenomenon arises mainly from the paste applied to the back side electrode of c-Si solar cells and the effects of SiNx (silicon nitride) and the paste on the front side are not considered significant. The bowing phenomenon is caused by a difference in the coefficient of expansion between heterogeneous materials, there is the effect of bowing on the front electrode and ARC. In this paper, a partially processed c-Si solar cell was fabricated and a bowing phenomenon variation according to the wafer thicknesses was confirmed. As a result of the experiment, the measured bow value after the firing process suggests that the paste on the front-side indicates a direction different from that of the back-side paste. The bow value increases when Al paste is deposited on SiNx. The fabricated c-Si solar cell was analyzed on basis of the correlation between the bowing phenomenon of the materials and the c-Si wafer using Stoney’s equation, which is capable of analyzing the relationship between bowing and stress. As a result, the bowing phenomenon of the c-Si solar cell estimated through the experiment that the back side electrode is the important element, but also the front electrode and ARC influence the bowing phenomenon when fabricating c-Si solar cells using thin c-Si wafers.

A thin silicon oxide (SiOx) layer (thickness: 1.5–2.0 nm) formed at an Al2O3/Si interface can enhance the interface properties. However, it is challenging to control the characteristics of thin SiOx layers because SiOx forms naturally during Al2O3 deposition on Si substrates. In this study, a ~1.5 nm-thick SiOx layer was inserted between Al2O3 and Si substrates by wet chemical oxidation to improve the passivation properties. The acidic solutions used for wet chemical oxidation were HCl:H2O2:H2O, H2SO4:H2O2:H2O, and HNO3. The thicknesses of SiOx layers formed in the acidic solutions were ~1.48, ~1.32, and ~1.50 nm for SiOx-HCl, SiOx-H2SO4, and SiOx-HNO3, respectively. The leakage current characteristics of SiOx-HNO3 were better than those of the oxide layers formed in the other acidic solutions. After depositing a ~10 nm-thick Al2O3 on an SiOx-acidic/Si structure, we measured the effective carrier lifetime using quasi steady-state photoconductance and examined the interfacial properties of Al2O3/SiOx-acidic/Si using surface carrier lifetime simulation and capacitance–voltage measurement. The effective carrier lifetime of Al2O3/SiOx-HNO3/Si was relatively high (~400 μs), resulting from the low surface defect density (2.35–2.88 × 1010 cm−2eV−1). The oxide layer inserted between Al2O3 and Si substrates by wet chemical oxidation helped improve the Al2O3/Si interface properties.