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We compare the three most commonly used scanning probe techniques to obtain a reliable value of the work function in graphene domains of different thickness. The surface potential (SP) of graphene is directly measured in Hall bar geometry via a combination of electrical functional microscopy and spectroscopy techniques, which enables calibrated work function measurements of graphene domains in ambient conditions with values Φ 1 LG ~4.55 ± 0.02 eV and Φ 2 LG ~ 4.44 ± 0.02 eV for single- and bi-layer, respectively. We demonstrate that frequency-modulated Kelvin probe force microscopy (FM-KPFM) provides more accurate measurement of the SP than amplitude-modulated (AM)-KPFM. The discrepancy between experimental results obtained by different techniques is discussed. In addition, we use FM-KPFM for contactless measurements of the specific components of the device resistance. We show a strong non-Ohmic behavior of the electrode-graphene contact resistance and extract the graphene channel resistivity.

In this work, we present a nanometer resolution structural characterization of epitaxial graphene (EG) layers grown on 4H-SiC (0001) 8° off-axis, by annealing in inert gas ambient (Ar) in a wide temperature range ( T gr from 1600 to 2000°C). For all the considered growth temperatures, few layers of graphene (FLG) conformally covering the 100 to 200-nm wide terraces of the SiC surface have been observed by high-resolution cross-sectional transmission electron microscopy (HR-XTEM). Tapping mode atomic force microscopy (t-AFM) showed the formation of wrinkles with approx. 1 to 2 nm height and 10 to 20 nm width in the FLG film, as a result of the release of the compressive strain, which builds up in FLG during the sample cooling due to the thermal expansion coefficients mismatch between graphene and SiC. While for EG grown on on-axis 4H-SiC an isotropic mesh-like network of wrinkles interconnected into nodes is commonly reported, in the present case of a vicinal SiC surface, wrinkles are preferentially oriented in the direction perpendicular to the step edges of the SiC terraces. For each T gr , the number of graphene layers was determined on very small sample areas by HR-XTEM and, with high statistics and on several sample positions, by measuring the depth of selectively etched trenches in FLG by t-AFM. Both the density of wrinkles and the number of graphene layers are found to increase almost linearly as a function of the growth temperature in the considered temperature range.

The quantum Hall effect 1 allows the international standard for resistance to be defined in terms of the electron charge and Planck's constant alone. The effect comprises the quantization of the Hall resistance in two-dimensional electron systems in rational fractions of R K  =  h / e 2  = 25 812.807 557(18) Ω, the resistance quantum 2 . Despite 30 years of research into the quantum Hall effect, the level of precision necessary for metrology—a few parts per billion—has been achieved only in silicon and iii – v heterostructure devices 3 , 4 , 5 . Graphene should, in principle, be an ideal material for a quantum resistance standard 6 , because it is inherently two-dimensional and its discrete electron energy levels in a magnetic field (the Landau levels 7 ) are widely spaced. However, the precisions demonstrated so far have been lower than one part per million 8 . Here, we report a quantum Hall resistance quantization accuracy of three parts per billion in monolayer epitaxial graphene at 300 mK, four orders of magnitude better than previously reported. Moreover, by demonstrating the structural integrity and uniformity of graphene over hundreds of micrometres, as well as reproducible mobility and carrier concentrations across a half-centimetre wafer, these results boost the prospects of using epitaxial graphene in applications beyond quantum metrology. The quantum Hall effect has been measured in epitaxial graphene to an accuracy of a few parts per billion, potentially establishing a new quantum resistance standard.

Graphene grown on C-face SiC substrates using two procedures, high and low growth temperature and different ambients, was investigated using Low Energy Electron Microscopy (LEEM), X-ray Photo Electron Electron Microscopy (XPEEM), selected area Low Energy Electron Diffraction (μ-LEED) and selected area Photo Electron Spectroscopy (μ-PES). Both types of samples showed formation of μm-sized grains of graphene. The sharp (1 × 1) μ-LEED pattern and six Dirac cones observed in constant energy photoelectron angular distribution patterns from a grain showed that adjacent layers are not rotated relative to each other, but that adjacent grains in general have different azimuthal orientations. Diffraction spots from the SiC substrate appeared in μ-LEED patterns collected at higher energies, showing that the rotation angle between graphene and SiC varied. C 1s spectra collected did not show any hint of a carbon interface layer. A hydrogen treatment applied was found to have a detrimental effect on the graphene quality for both types of samples, since the graphene domain/grain size was drastically reduced. From hydrogen treated samples, μ-LEED showed at first a clear (1 × 1) pattern, but within minutes, a pattern containing strong superstructure spots, indicating the presence of twisted graphene layers. The LEED electron beam was found to induce local desorption of hydrogen. Heating a hydrogenated C-face graphene sample did not restore the quality of the original as-grown sample.

Using local scanning electrical techniques we study edge effects in side-gated Hall bar nanodevices made of epitaxial graphene. We demonstrate that lithographically defined edges of the graphene channel exhibit hole conduction within the narrow band of ~60–125 nm width, whereas the bulk of the material is electron doped. The effect is the most pronounced when the influence of atmospheric contamination is minimal. We also show that the electronic properties at the edges can be precisely tuned from hole to electron conduction by using moderate strength electrical fields created by side-gates. However, the central part of the channel remains relatively unaffected by the side-gates and retains the bulk properties of graphene.

Spectacular advances in heterodyne astronomy1,2 have been largely due to breakthroughs in detector technology3. To exploit the full capacity of future terahertz (∼300 GHz–5 THz) telescope space missions4, new concepts of terahertz coherent receivers are needed, providing larger bandwidths and imaging capabilities with multipixel focal plane heterodyne arrays5. Here we show that graphene uniformly doped to the Dirac point, with material resistance dominated by quantum localization and thermal relaxation governed by electron diffusion, enables highly sensitive and wideband coherent detection of signals from 90 to 700 GHz and, prospectively, across the entire terahertz range. We measure on proof-of-concept graphene bolometric mixers an electron diffusion-limited gain bandwidth of 8 GHz (corresponding to a Doppler shift of 480 km s−1 at 5 THz) and intrinsic mixer noise temperature of 475 K (which would be equivalent to ~2 hf/kB at f = 5 THz, where h is Planck’s constant, f is the frequency and kB is the Boltzmann constant), limited by the residual thermal background in our setup. An optimized device will result in a mixer noise temperature as low as 36 K, with the gain bandwidth exceeding 20 GHz, and a local oscillator power of <100 pW. In conjunction with the emerging quantum-limited amplifiers at the intermediate frequency6,7, our approach promises quantum-limited sensing in the terahertz domain, potentially surpassing superconducting technologies, particularly for large heterodyne arrays.Graphene doped to the Dirac point can be used to detect signals from 90 to 700 GHz, and prospectively across the entire terahertz range, with high sensitivity. Such a sensor could be used in next-generation space-based telescopes, promising quantum-limited detection that surpasses superconducting technologies.

We demonstrate a time-efficient and low-cost approach to fabricate Si 3 N 4 coated nanodome structures in fluorescent SiC. Nanosphere lithography is used as the nanopatterning method and SiC nanodome structures with Si 3 N 4 coating are formed via dry etching and thin film deposition process. By using this method, a significant broadband surface antireflection and a considerable omnidirectional luminescence enhancement are obtained. The experimental observations are then supported by numerical simulations. It is believed that our fabrication method will be well suitable for large-scale production in the future.

Two-dimensional materials offer a unique platform for sensing where extremely high sensitivity is a priority, since even minimal chemical interaction causes noticeable changes in electrical conductivity, which can be used for the sensor readout. However, the sensitivity has to be complemented with selectivity, and, for many applications, improved response- and recovery times are needed. This has been addressed, for example, by combining graphene (for sensitivity) with metal/oxides (for selectivity) nanoparticles (NP). On the other hand, functionalization or modification of the graphene often results in poor reproducibility. In this study, we investigate the gas sensing performance of epitaxial graphene on SiC (EG/SiC) decorated with nanostructured metallic layers as well as metal-oxide nanoparticles deposited using scalable thin-film deposition techniques, like hollow-cathode pulsed plasma sputtering. It is demonstrated that under the right modification conditions the electronic properties of the surface remain those of graphene, while the surface chemistry can be tuned to improve sensitivity, selectivity and speed of response to several gases relevant for air quality monitoring and control, such as nitrogen dioxide, benzene, and formaldehyde.

300 μm thick 3C-SiC epilayer was grown on off-axis 4H-SiC(0001) substrate with a high growth rate of 1 mm/hour. Dry oxidation, wet oxidation and N2O anneal were applied to fabricate lateral MOS capacitors on these 3C-SiC layers. MOS interface obtained by N2O anneal has the lowest interface trap density of 3~4x1011 eV-1cm-2. Although all MOS capacitors still have positive net charges at the MOS interface, the wet oxidised sample has the lowest effective charge density of ~9.17x1011 cm-2.

There is a strong and growing worldwide research on exploring renewable energy resources. Solar energy is the most abundant, inexhaustible and clean energy source, but there are profound material challenges to capture, convert and store solar energy. In this work, we explore 3C-SiC as an attractive material towards solar-driven energy conversion applications: (i) Boron doped 3C-SiC as candidate for an intermediate band photovoltaic material, and (ii) 3C-SiC as a photoelectrode for solar-driven water splitting. Absorption spectrum of boron doped 3C-SiC shows a deep energy level at ~0.7 eV above the valence band edge. This indicates that boron doped 3C-SiC may be a good candidate as an intermediate band photovoltaic material, and that bulk like 3C-SiC can have sufficient quality to be a promising electrode for photoelectrochemical water splitting.