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30 result(s) for "Combinatorial magnetron sputtering"
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Modeling of metastable phase formation diagrams for sputtered thin films
A method to model the metastable phase formation in the Cu-W system based on the critical surface diffusion distance has been developed. The driver for the formation of a second phase is the critical diffusion distance which is dependent on the solubility of W in Cu and on the solubility of Cu in W. Based on comparative theoretical and experimental data, we can describe the relationship between the solubilities and the critical diffusion distances in order to model the metastable phase formation. Metastable phase formation diagrams for Cu-W and Cu-V thin films are predicted and validated by combinatorial magnetron sputtering experiments. The correlative experimental and theoretical research strategy adopted here enables us to efficiently describe the relationship between the solubilities and the critical diffusion distances in order to model the metastable phase formation during magnetron sputtering.
Effect of Si Content on Deposition and High-Temperature Oxidation of Al-Si Coatings Obtained by Magnetron Sputtering PVD Method
Intermetallic Al-Si-based coatings can greatly increase the oxidation resistance of γ-TiAl alloys. However, the effects of the Si addition are not fully understood. Therefore, it is difficult to determine the Si content that is optimal for oxidation resistance. Therefore, pure Al and several Al-Si coatings with varying Si contents between 1 and 81 at.% were studied. The coatings were produced using a combinatorial magnetron sputtering process. Scanning electron microscopy and energy dispersive X-ray spectroscopy were used for structure and chemical analysis. The phases were identified by X-ray diffraction. Cyclic oxidation tests at 900 °C were conducted up to 5000 cycles of 1 h each and subsequently evaluated by thermogravimetric analysis. Si addition in the range of 1 to 12 at.% did not deteriorate the oxidation resistance compared to a pure Al coating up for 1000 cycles (1 h) of oxidation at 900 °C, while higher Si contents led to a high mass gain. For oxidation times up to 5000 cycles (1 h), a sufficient thickness of the coatings is crucial for good oxidation resistance. The main effect of Si addition is to enhance the transformation speed of the deposited Al and Si to the high temperature stable Ti(Al,Si)3 phase during the heat treatment. Si additions of up to 12 at.% led to increased initial mass gains and a decrease in the oxidation rates during subsequent exposures compared to pure Al coatings.
Compositional Optimization of Sputtered WO3/MoO3 Films for High Coloration Efficiency
Thin films of mixed MoO3 and WO3 were obtained using reactive magnetron sputtering onto ITO-covered glass, and the optimal composition was determined for the best electrochromic (EC) properties. A combinatorial material synthesis approach was applied throughout the deposition experiments, and the samples represented the full composition range of the binary MoO3/WO3 system. The electrochromic characteristics of the mixed oxide films were determined with simultaneous measurement of layer transmittance and applied electric current through the using organic propylene carbonate electrolyte cells in a conventional three-electrode configuration. Coloration efficiency data evaluated from the primary data plotted against the composition displayed a characteristic maximum at around 60% MoO3. Our combinatorial approach allows the localization of the maximum at 5% accuracy.
A Comprehensive Review on Combinatorial Film via High-Throughput Techniques
Numerous technological advancements in the 21st century depend on the creation of novel materials possessing enhanced properties; there is a growing reliance on materials that can be optimized to serve multiple functions. To efficiently save time and meet the requirements of diverse applications, high-throughput and combinatorial approaches are increasingly employed to explore and design superior materials. Among them, gradient thin-film deposition is one of the most mature and widely used technologies for high-throughput preparation of material libraries. This review summarizes recent progress in gradient thin-film deposition fabricated by magnetron sputtering, multi-arc ion plating, e-beam evaporation, additive manufacturing, and chemical bath deposition, providing readers with a fundamental understanding of this research field. First, high-throughput synthesis methods for gradient thin films are emphasized. Subsequently, we present the characteristics of combinatorial films, including microstructure, oxidation, corrosion tests, and mechanical properties. Next, the screening methods employed for evaluating these properties are discussed. Furthermore, we delve into the limitations of high-throughput preparation and characterization techniques for combinatorial films. Finally, we provide a summary and offer our perspectives.
High-throughput exploration of the Na2O-ZrO2-SiO2-P2O5 composition space using thin film material libraries
The composition space Na 2 O-ZrO 2 -SiO 2 -P 2 O 5 was explored using thin film material libraries and high-throughput characterization methods. The combinatorial synthesis comprised non-reactive magnetron co-sputtering at room temperature from two elemental targets Zr and Si, and a compound Na 3 PO 4 target followed by a two-step annealing process. The NASICON phase formed for all compositions on the material library produced at the optimized deposition parameters, also displaying a phase-pure Na 1+x Zr 2 Si x P 3−x O 12 ( x  = 0.4—2.9) region. Analytical TEM analysis of the NASICON phase at a measurement area with stoichiometric composition revealed a fine-grained microstructure and homogeneous Si distribution, in contrast to Na-P excess conditions, where large Si-free NASICON grains have formed.
Synthesis of Intermetallic (Mg1−x,Alx)2Ca by Combinatorial Sputtering
The synthesis–composition–structure relationship in the Mg–Ca–Al system is studied using combinatorial magnetron sputtering. With increasing deposition temperature, a drastic decrease in Mg concentration is obtained. This behavior can be understood based on density functional theory calculations yielding a desorption energy of 1.9 eV/atom for Mg from a hexagonal Mg nanocluster which is far below the desorption energy of Mg from a Mg2Ca nanocluster (3.4 eV/atom) implying desorption of excess Mg during thin film growth at elevated temperatures. Correlative structural and chemical analysis of binary Mg–Ca thin films suggests the formation of hexagonal Mg2Ca (C14 Laves phase) in a wide Mg/Ca range from 1.7 to 2.2, expanding the to date reported stoichiometry range. Pronounced thermally-induced desorption of Mg is utilized to synthesize stoichiometric (Mg1−x,Alx)2Ca thin films by additional co-sputtering of elemental Al, exhibiting a higher desorption energy (6.7 eV/atom) compared to Mg (3.4 eV/atom) from Mg2Ca, which governs its preferred incorporation during synthesis. X-ray diffraction investigations along the chemical gradient suggest the formation of intermetallic C14 (Mg1–x,Alx)2Ca with a critical aluminum concentration of up to 23 at.%. The introduced synthesis strategy, based on the thermally-induced desorption of weakly bonded species, and the preferential incorporation of strongly bonded species, may also be useful for solubility studies of other phases within this ternary system as well as for other intermetallics with weakly bonded alloying constituents.
Discovery of Highly Active Noble‐Metal‐Lean Mo−Ru Electrocatalysts for Hydrogen Evolution
The discovery of high‐performance electrocatalysts for water electrolysis is highly important. We use a strategy for catalyst discovery based on high‐throughput screening of a broad range of materials compositions on a thin‐film materials library to identify noble‐metal‐lean multi‐metal compositions with high activity towards the hydrogen evolution reaction in alkaline electrolyte. We demonstrate this strategy using a quaternary materials library containing Mo, Ag, Ti, and Ru fabricated by combinatorial magnetron sputtering on a 10 cm diameter wafer providing 342 measurement areas. Surprisingly, binary Mo−Ru‐containing catalyst compositions with comparatively low Ru content exhibited the highest activity. Using the polymer/metal precursor‐based spray technique, Ni foam electrodes were modified with the Mo−Ru hit compositions and evaluated in a model electrolyzer in membrane electrode assembly (MEA) configuration. The electrodes showed a very low overpotential of only 132 mV at a comparatively high current density of −2 A cm−2 and a 24 h electrolysis stability at −1 A cm−2 with no observable degradation after the initial electrode conditioning. A high‐throughput catalyst strategy discovered a stable and active noble‐metal lean Mo−Ru electrocatalyst for the hydrogen evolution reaction in alkaline media. Wet‐chemical synthesis on Ni foam and evaluation in a model flow‐through electrolyzer in a membrane‐electrode‐assembly configuration showed an overpotential of ~73 mV at a current density of −1 A cm−2 with high stability for 24 h.
Electrical Behavior of Combinatorial Thin-Film ZrxTa1−xOy
Combinatorial magnetron sputtering and electrical characterization were used to systematically study the impact of compositional changes in the resistive switching of transition metal oxides, specifically the ZrxTa1−xOy system. Current-voltage behavior across a range of temperatures provided insights into the mechanisms that contribute to differences in the electrical conductivity of the pristine Ta2O5 and ZrO2, and mixed ZrxTa1−xOy devices. The underlying conductive mechanism was found to be a mixture of charge trapping and ionic motion, where charge trapping/emission dictated the short-term cycling behavior while ion motion contributed to changes in the conduction with increased cycling number. ToF-SIMS was used to identify the origin of the “wake-up” behavior of the devices, revealing an ionic motion contribution. This understanding of how cation concentration affects conduction in mixed valence systems helps provide a foundation for a new approach toward manipulating resistive switching in these active layer materials.
Growth of Al-Cu Thin Films on LiNbO3 Substrates for Surface Acoustic Wave Devices Based on Combinatorial Radio Frequency Magnetron Sputtering
Al-Cu thin films were fabricated by RF magnetron sputtering from aluminum (Al) and copper (Cu) metal targets to improve the acoustic performance of SAW devices on LiNbO3 substrates. To optimize the electrode material for SAW devices, Al-Cu films with various compositions were fabricated and their electrical, mechanical, and acoustic properties were comprehensively evaluated. The Al-Cu films exhibited a gradual decrease in resistivity with increasing Al content. The double-electrode SAW devices composed of Al-Cu films demonstrated a resonant frequency of 70 MHz and an average insertion loss of −16.1 dB, which was significantly lower than that of devices made with traditional Au or Al electrodes. Additionally, the SAW devices showed an increase in the FWHM values of the resonant frequency and a decrease in the insertion loss as the Al content in the IDT electrode decreased. These findings indicate that improving the performance of SAW devices can be achieved by reducing the density of the IDT electrodes, rather than focusing solely on their electrical characteristics.
Structure Zone Investigation of Multiple Principle Element Alloy Thin Films as Optimization for Nanoindentation Measurements
Multiple principal element alloys, also often referred to as compositionally complex alloys or high entropy alloys, present extreme challenges to characterize. They show a vast, multidimensional composition space that merits detailed investigation and optimization to identify compositions and to map the composition ranges where useful properties are maintained. Combinatorial thin film material libraries are a cost-effective and efficient way to create directly comparable, controlled composition variations. Characterizing them comes with its own challenges, including the need for high-speed, automated measurements of dozens to hundreds or more compositions to be screened. By selecting an appropriate thin film morphology through predictable control of critical deposition parameters, representative measured values can be obtained with less scatter, i.e., requiring fewer measurement repetitions for each particular composition. In the present study, equiatomic CoCrFeNi was grown by magnetron sputtering in different locations in the structure zone diagram applied to multinary element alloys, followed by microstructural and morphological characterizations. Increasing the energy input to the deposition process by increased temperature and adding high-power impulse magnetron sputtering (HiPIMS) plasma generators led to denser, more homogeneous morphologies with smoother surfaces until recrystallization and grain boundary grooving began. Growth at 300 °C, even without the extra particle energy input of HiPIMS generators, led to consistently repeatable nanoindentation load–displacement curves and the resulting hardness and Young’s modulus values.