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Enhanced nonlinear refractive index in epsilon-near-zero materials
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Paper
Enhanced nonlinear refractive index in epsilon-near-zero materials
2016
Overview
New propagation regimes for light arise from the ability to tune the dielectric permittivity to extremely low values. Here we demonstrate a universal approach based on the low linear permittivity values attained in the epsilon-near-zero (ENZ) regime for enhancing the nonlinear refractive index, which enables remarkable light-induced changes of the material properties. Experiments performed on Al-doped ZnO (AZO) thin films show a six-fold increase of the Kerr nonlinear refractive index (\\(n_2\\)) at the ENZ wavelength, located in the 1300 nm region. This in turn leads to ultrafast light-induced refractive index changes of the order of unity, thus representing a new paradigm for nonlinear optics.
Publisher
Cornell University Library, arXiv.org
Subject
