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Handbook of Physical Vapor Deposition (PVD) Processing (2nd Edition)
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Handbook of Physical Vapor Deposition (PVD) Processing (2nd Edition)
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eBook
Handbook of Physical Vapor Deposition (PVD) Processing (2nd Edition)
2010,2009
Overview
This updated version of the popular Handbook further explains all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the new edition remains on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications, with additional information to support the original material. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field.
Publisher
Elsevier,William Andrew,Elsevier Science & Technology Books
Subject
ISBN
9780815520375, 0815520379, 0815520387, 9780815520382
