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Particle Velocity and Deposition Efficiency in the Cold Spray Process
Particle Velocity and Deposition Efficiency in the Cold Spray Process
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Particle Velocity and Deposition Efficiency in the Cold Spray Process
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Particle Velocity and Deposition Efficiency in the Cold Spray Process
Particle Velocity and Deposition Efficiency in the Cold Spray Process
Journal Article

Particle Velocity and Deposition Efficiency in the Cold Spray Process

1999
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Overview
Copper powder was sprayed by the cold gas-dynamic method. In-flight particle velocities were measured with a laser two-focus system as a function of process parameters such as gas temperature, gas pressure, and powder feed rate. Mean particle velocities were uniform in a relatively large volume within the plume and agreed with theoretical predictions. The presence of a substrate was found to have no significant effect on in-flight particle velocities prior to impact. Cold-spray deposition efficiencies were measured on aluminum substrates as a function of particle velocity and incident angle of the plume. Deposition efficiencies of up to 95% were achieved. The critical velocity for deposition was determined to be about 640 m/s for the system studied.