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Effects of the ratio of Al/Ti target current on the chemical composition, structure, morphology, wettability and corrosion resistance of sputtered titanium aluminium films
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Effects of the ratio of Al/Ti target current on the chemical composition, structure, morphology, wettability and corrosion resistance of sputtered titanium aluminium films
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Effects of the ratio of Al/Ti target current on the chemical composition, structure, morphology, wettability and corrosion resistance of sputtered titanium aluminium films
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Journal Article
Effects of the ratio of Al/Ti target current on the chemical composition, structure, morphology, wettability and corrosion resistance of sputtered titanium aluminium films
2021
Overview
Titanium aluminium (TiAl) alloy thin films were deposited on silicon wafer and stainless steel substrate by sputtering method. The effects of the Al/Ti target current ratio (R) on chemical composition, structure, surface morphology, wettability, and corrosion resistance of the deposited films were investigated using energy dispersive X-ray spectroscopy (EDX), X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), contact angle measurement, and potentiostat, respectively. In the experiment, when the Al/Ti target current ratio increased from 0.375 to 1.5, the Al/Ti concentration ratio of the deposited films increased. When the Al/Ti target current ratios were 1.0 and 1.5, the deposited film structure exhibited γ-TiAl phase with tetragonal crystal structure. Moreover, the Al/Ti target current ratio of 1.5 provided the deposited film with the highest crystallinity, surface roughness, hydrophobicity, and corrosion resistance.
Publisher
IOP Publishing
