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Ellipsometry Analysis of Titanium Nitride Thin Film Prepared by Reactive Magnetron Sputtering
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Ellipsometry Analysis of Titanium Nitride Thin Film Prepared by Reactive Magnetron Sputtering
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Journal Article
Ellipsometry Analysis of Titanium Nitride Thin Film Prepared by Reactive Magnetron Sputtering
2025
Overview
Titanium nitride film was deposited on a glass substrate by reactive magnetron sputtering. The composition and structure of the film were studied by SEM, XRD and XPS. The results show that the atomic ratio of titanium to nitrogen in the film is TiN1.05, and the crystal orientation of the film is mainly TiN (111). The optical properties of titanium nitride films in the wavelength range from 380nm to 2500nm were studied in detail using a spectral ellipsometer. Four commonly used dispersion models including Gaussian and Lorentz are compared to resolve the fitting effect of the ellipsometry spectrum of titanium nitride films. The fitting results were validated by reflection and transmission spectra. The results show that the Lorentz model combined with the Drude model is the best fit for the elliptic spectrum of titanium nitride films over the entire range of bands tested.
Publisher
IOP Publishing
