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Research on the Frequency Stabilization System of an External Cavity Diode Laser Based on Rubidium Atomic Modulation Transfer Spectroscopy Technology
Research on the Frequency Stabilization System of an External Cavity Diode Laser Based on Rubidium Atomic Modulation Transfer Spectroscopy Technology
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Research on the Frequency Stabilization System of an External Cavity Diode Laser Based on Rubidium Atomic Modulation Transfer Spectroscopy Technology
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Research on the Frequency Stabilization System of an External Cavity Diode Laser Based on Rubidium Atomic Modulation Transfer Spectroscopy Technology
Research on the Frequency Stabilization System of an External Cavity Diode Laser Based on Rubidium Atomic Modulation Transfer Spectroscopy Technology

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Research on the Frequency Stabilization System of an External Cavity Diode Laser Based on Rubidium Atomic Modulation Transfer Spectroscopy Technology
Research on the Frequency Stabilization System of an External Cavity Diode Laser Based on Rubidium Atomic Modulation Transfer Spectroscopy Technology
Journal Article

Research on the Frequency Stabilization System of an External Cavity Diode Laser Based on Rubidium Atomic Modulation Transfer Spectroscopy Technology

2024
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Overview
To achieve high-frequency stability on the external cavity diode laser (ECDL), a 780 nm ECDL serves as the seed light source, and its frequency is precisely locked to the saturated absorption peak of rubidium (Rb) atoms using modulation transfer spectroscopy (MTS) technology. For improving the performance of frequency locking, the scheme is designed to find the optimal operating conditions. Correlations between the frequency discrimination signal (FDS) and critical parameters, such as the temperature of the Rb cell, the power ratio of the probe and pump light, and the frequency and amplitude of the modulation and demodulation signals, are observed to attain the optimal conditions for frequency locking. To evaluate the performance of the frequency-stabilized 780 nm ECDL, a dual-beam heterodyne setup was constructed. Through this arrangement, the laser linewidth, approximately 65.4 kHz, is measured. Then, the frequency stability of the laser, quantified as low as 4.886 × 10−12 @32 s, is determined by measuring the beat-frequency signal with a frequency counter and calculating the Allan variance. Furthermore, using the realized frequency locking technology, the 780 nm ECDL can achieve long-term stabilization even after 25 h. The test results show the exceptional performance of the implemented frequency stabilization system for the 780 nm ECDL.