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Electrometry by optical charge conversion of deep defects in 4H-SiC
Electrometry by optical charge conversion of deep defects in 4H-SiC
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Electrometry by optical charge conversion of deep defects in 4H-SiC
Electrometry by optical charge conversion of deep defects in 4H-SiC

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Electrometry by optical charge conversion of deep defects in 4H-SiC
Electrometry by optical charge conversion of deep defects in 4H-SiC
Journal Article

Electrometry by optical charge conversion of deep defects in 4H-SiC

2018
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Overview
Optically active point defects in various host materials, such as diamond and silicon carbide (SiC), have shown significant promise as local sensors of magnetic fields, electric fields, strain, and temperature. Modern sensing techniques take advantage of the relaxation and coherence times of the spin state within these defects. Here we show that the defect charge state can also be used to sense the environment, in particular high-frequency (megahertz to gigahertz) electric fields, complementing established spin-based techniques. This is enabled by optical charge conversion of the defects between their photoluminescent and dark charge states, with conversion rate dependent on the electric field (energy density). The technique provides an all-optical high-frequency electrometer which is tested in 4H-SiC for both ensembles of divacancies and silicon vacancies, from cryogenic to room temperature, and with a measured sensitivity of 41 ± 8 (V /cm)² / √Hz. Finally, due to the piezoelectric character of SiC, we obtain spatial 3D maps of surface acoustic wave modes in a mechanical resonator.