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Lattice Mismatch‐Driven In‐Plane Strain Engineering for Enhanced Upper Critical Fields in Mo2N Superconducting Thin Films
by
Hjort, Victor
, Febvrier, Arnaud
, Eklund, Per
, Singh, Aditya
, Bedanta, Subhankar
, Soni, Ajay
, Rawat, Divya
, Mishra, Abhisek
in
Aluminum oxide
/ DC magnetron sputtering
/ Direct current
/ Elastic analysis
/ Electrons
/ Epitaxial growth
/ Hard surfacing
/ Magnesium oxide
/ Magnetron sputtering
/ Metal nitrides
/ molybdenum nitride
/ Plane strain
/ strain engineering
/ Substrates
/ Superconductivity
/ Thin films
/ Transition metals
2025
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Lattice Mismatch‐Driven In‐Plane Strain Engineering for Enhanced Upper Critical Fields in Mo2N Superconducting Thin Films
by
Hjort, Victor
, Febvrier, Arnaud
, Eklund, Per
, Singh, Aditya
, Bedanta, Subhankar
, Soni, Ajay
, Rawat, Divya
, Mishra, Abhisek
in
Aluminum oxide
/ DC magnetron sputtering
/ Direct current
/ Elastic analysis
/ Electrons
/ Epitaxial growth
/ Hard surfacing
/ Magnesium oxide
/ Magnetron sputtering
/ Metal nitrides
/ molybdenum nitride
/ Plane strain
/ strain engineering
/ Substrates
/ Superconductivity
/ Thin films
/ Transition metals
2025
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Lattice Mismatch‐Driven In‐Plane Strain Engineering for Enhanced Upper Critical Fields in Mo2N Superconducting Thin Films
by
Hjort, Victor
, Febvrier, Arnaud
, Eklund, Per
, Singh, Aditya
, Bedanta, Subhankar
, Soni, Ajay
, Rawat, Divya
, Mishra, Abhisek
in
Aluminum oxide
/ DC magnetron sputtering
/ Direct current
/ Elastic analysis
/ Electrons
/ Epitaxial growth
/ Hard surfacing
/ Magnesium oxide
/ Magnetron sputtering
/ Metal nitrides
/ molybdenum nitride
/ Plane strain
/ strain engineering
/ Substrates
/ Superconductivity
/ Thin films
/ Transition metals
2025
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Lattice Mismatch‐Driven In‐Plane Strain Engineering for Enhanced Upper Critical Fields in Mo2N Superconducting Thin Films
Journal Article
Lattice Mismatch‐Driven In‐Plane Strain Engineering for Enhanced Upper Critical Fields in Mo2N Superconducting Thin Films
2025
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Overview
Transition metal nitrides are a fascinating class of hard coating material that provides an excellent platform for investigating superconductivity and fundamental electron‐phonon (e‐ph) interactions. In this work, the structural, morphological, and superconducting properties have been studied for Mo2N thin films deposited via direct current magnetron sputtering on c‐plane Al2O3 and MgO substrates to elucidate the effect of internal strain on superconducting properties. High‐resolution X‐ray diffraction and time‐of‐flight elastic recoil detection analysis confirm the growth of single‐phase Mo2N thin films exhibiting epitaxial growth with twin‐domain structure. Low‐temperature electrical transport measurements reveal superconducting transitions at ≈5.2 and ≈5.6 K with corresponding upper critical fields of ≈5 and ≈7 T for the films deposited on Al2O3 and MgO, respectively. These results indicate strong type‐II superconductivity, and the observed differences in superconducting properties are attributed to substrate‐induced strain, which leads to higher e‐ph coupling for the film on MgO substrate. These findings highlight the tunability of superconducting properties in Mo2N films through strategic substrate selection. Compressive strain in Mo2N thin films on MgO substrates significantly enhances electron‐phonon coupling, resulting in a ∼25% increase in the upper critical field compared to films on Al2O3 substrate. This finding demonstrates an effective strategy for achieving higher‐performance superconducting devices by utilizing strain as a tunable parameter to optimize superconducting properties.
Publisher
John Wiley & Sons, Inc,Wiley-VCH
Subject
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