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Chromium Nitride (CrN) coatings have widespread utilization across numerous industrial applications, primarily attributed to their excellent properties. Among the different methods for CrN coating synthesis, direct current magnetron sputtering (DCMS) has been the dominant technique applied. Nonetheless, with the expanded applications of CrN coatings, the need for enhanced mechanical performance is concurrently escalating. High-power impulse magnetron sputtering (HiPIMS), an innovative coating deposition approach developed over the past three decades, is gaining recognition for its capability of yielding coatings with superior mechanical attributes, thereby drawing significant research interest. Considering that the mechanical performance of a coating is fundamentally governed by its microstructural properties, a comprehensive review of CrN coatings fabricated through both techniques is presented. This review of recent literature aims to embark on an insightful comparison between DCMS and HiPIMS, followed by an examination of the microstructure of CrN coatings fabricated via both techniques. Furthermore, the exploration of the underlying factors contributing to the disparities in mechanical properties observed in CrN coatings is revealed. An assessment of the advantages and potential shortcomings of HiPIMS is discussed, offering insight into CrN coating fabrication.

In the present research diamond-like carbon (DLC) films containing 4–29 at.% of silicon were deposited by reactive magnetron sputtering of carbon target. Study by X-ray photoelectron spectroscopy revealed the presence of Si–C bonds in the films. Nevertheless, a significant amount of Si–O–C and Si–Ox bonds was present too. The shape of the Raman scattering spectra of all studied diamond-like carbon containing silicon (DLC:Si) films was typical for diamond-like carbon. However, some peculiarities related to silicon doping were found. Studies on the dependence of DLC:Si of the optical transmittance spectra on the Si atomic concentration have shown that doping by silicon affects linear, as well as nonlinear, optical properties of the films. It is shown that the normalized reflectance of DLC:Si films decreased with the increased exciting light fluence. No clear relation between the normalized reflectance and photoexcited charge carrier relaxation time was found. It was suggested that that the normalized reflectance decrease with fluence can be related to nonlinear optical properties of the hydrogenated diamond-like carbon phase in DLC:Si film.

Titanium nitride film was deposited on a glass substrate by reactive magnetron sputtering. The composition and structure of the film were studied by SEM, XRD and XPS. The results show that the atomic ratio of titanium to nitrogen in the film is TiN1.05, and the crystal orientation of the film is mainly TiN (111). The optical properties of titanium nitride films in the wavelength range from 380nm to 2500nm were studied in detail using a spectral ellipsometer. Four commonly used dispersion models including Gaussian and Lorentz are compared to resolve the fitting effect of the ellipsometry spectrum of titanium nitride films. The fitting results were validated by reflection and transmission spectra. The results show that the Lorentz model combined with the Drude model is the best fit for the elliptic spectrum of titanium nitride films over the entire range of bands tested.

Reverse osmosis (RO) is the most common method for treating salt and brackish water. As a membrane‐driven process, a key challenge for RO systems is their susceptibility to scaling and biofouling. To address these issues, functional coatings utilizing metal nanoparticles (MNPs) are developed. In this study, silver, gold, and copper nanoparticles are applied onto thin‐film composite (TFC) membranes using plasma‐enhanced magnetron sputtering. The elemental composition, surface morphology, and hydrophilicity of the coatings are analyzed using X‐ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), and contact angle measurements. The antimicrobial properties and the filtration efficiency of the coated membranes are assessed through application‐specific experimental setups. Silver and copper nanoparticles exhibit superior antimicrobial properties, reducing microorganism adhesion by a factor of 103 compared to uncoated membranes. Under appropriate coating conditions, no deterioration in filtration performance is observed. Enhancing the adhesion of MNPs is necessary for achieving sustained release of metal ions. This study investigates the use of plasma‐enhanced magnetron sputtering for applying biofunctional MNP coatings to RO composite membranes. Application‐oriented laboratory tests demonstrate that silver and copper nanoparticle coatings can be applied via vacuum‐based processes without compromising membrane performance while providing excellent antimicrobial properties.

Compact ZnO (wurtzite) thin films are prepared on four different substrates by (i) spray pyrolysis or (ii) pulsed reactive magnetron sputtering combined with a radio frequency electron cyclotron wave resonance plasma. Films are characterized by AFM, XRD, Kelvin probe, cyclic voltammetry, electrochemical impedance spectroscopy, and UV photoelectrochemistry. Film morphologies, defect concentrations, crystallite size, and orientation provided specific fingerprints for the electronic structure of ZnO close to the conduction band minimum. Fabricated films are referenced, if relevant, to a model system based on a wurtzite single crystal with either Zn-face or O-face termination. Kelvin probe measurements of the ZnO/air interface distinguished effects of annealing and UV excitation, which are attributed to removal of oxygen vacancies close to the surface. In turn, the work function, at the electrochemical interface, specifically addressed the growth protocol of the ZnO electrodes but not the effects of crystallinity and annealing. Finally, high photocurrents of water oxidation are observed exclusively on virgin films. This effect is then discussed in terms of photocorrosion, and work function changes due to UV light. Graphical Abstract

Transition metal aluminium nitrides produced by physical vapour deposition are widely used as hard, protective coatings in the manufacturing industries. To optimise coatings wear resistance while maintaining fracture toughness, an understanding of the mechanisms linking the microstructure and the orientation-dependent fracture behaviour is required. (V,Al)N coatings were synthesised by direct current and high power pulsed magnetron sputtering. Uniaxial compression testing was performed using micropillars oriented between 0° and 90° with respect to the growth direction to assess the effect of microstructure on the fracture behaviour. We show here that different fracture mechanisms are active depending on the alignment of grains and loading direction. The fracture behaviour could be divided into three classes associated with column buckling, decohesion or shearing and no significant difference between the specimens induced by the deposition process could be observed. Graphical abstract

This work presents a study of piezoelectric zinc oxide (ZnO) thin films deposited by a novel post‐reactive sputtering method. The process utilizes a rotating drum with DC magnetron sputtering deposition onto substrates with subsequent DC plasma‐assisted oxidation of the deposited metal to metal oxide. The paper analyzes the influence of plasmaassisted magnetron sputtering (PA‐MS) deposition parameters (O2 plasma source power, O2 flow, and Ar flow) on the morphological, structural, optical, and piezoelectric properties of ZnO thin films. Design of experiments has been utilized to evaluate the role of these parameters on the growth rate (rg) and the properties of resulting films. Results indicate a predominant influence of the plasma power on the rg over other parameters. Among the eight tested samples, three of them show high crystal quality with high intensity (0001) diffraction peak, characteristic of the wurtzite crystalline structure of ZnO, and one of them exhibits piezoelectric coefficient values of ≈11pC N−1. That sample corresponding to a ZnO film deposited at the lowest rg of 0.075 nm s−1, confirmed the key role of the deposition parameters on the piezoelectric response of films, and demonstrated PA‐MS as a promising technique to produce high‐quality piezoelectric thin films. This article explores a novel post‐oxidization process for producing highly piezoelectric zinc oxide (ZnO) thin films. Statistical methods are used in conjunction with extensive material characterization to provide a thorough investigation and optimization of the films. Linear statistical interpolation and modelling are also utilized to provide a deep understanding of the relationship between newfound deposition parameters and piezoelectricity.

Thin films of Bi2Se3 were deposited on Si (100) substrates using RF magnetron sputtering at a deposition temperature of 633 K. The surface morphology of Bi2Se3 films revealed the variation of grain sizes with thickness, while elemental analysis showed the stoichiometric Bi2Se3 films. The high-intensity x-ray diffraction peaks along (0003), (0006) and (00015) planes showed the dominant orientation of Bi2Se3 along the c-axis on Si (100). Three prominent Raman characteristic peaks, E2g, A11g, and A21g modes, were observed which revealed a pure hexagonal phase. X-ray photoelectron spectroscopy analysis showed the growth of high-purity Bi2Se3 films. The temperature-dependent electrical conductivity measurements showed the increase in conductivity with temperature due to the semiconducting nature. Seebeck coefficient of these films falls in the range of −153 to −236 µV/K near room temperature. These findings pave the way for economically preparing large-area and high-performance Bi2Se3 thin films for future thermoelectric devices.

In this work, tantalum-doped tungsten boride ceramic coatings were deposited from a single sputtering target with the radio frequency (RF) and high-power impulse magnetron sputtering (HiPIMS) methods. Two-inch torus targets were synthesised from pure elements with the spark plasma sintering (SPS) method with a stoichiometric composition of W 1-x Ta x B 2.5 ( x  = 0, 0.08, 0.16, 0.24). Films were deposited with RF and HiPIMS power suppliers at process temperatures from RT to 600 °C. The substrate heating and the energy of the ionised material impacting the substrate increase the surface diffusivity of adatoms and are crucial in the deposition process. The results of SEM and XRD investigations clearly show that the addition of tantalum also changes the microstructure of the deposited films. The coatings without tantalum possess a finer microstructure than those with 24% of tantalum. The structure of films is homogeneous along the film thickness and composed mainly of columns with a (0001) preferred orientation. Deposited coatings are composed mainly of P 6 /mmm α -WB 2 structures. The analysis of nanoindentation results allowed us to determine that ceramic coatings obtained with the HiPIMS method possess hardness above 41 GPa and a ratio of hardness to reduced Young modulus above 0.1. The thickness of HiPIMS-deposited films is relatively small: only around 60% of the RF magnetron sputtered coatings even when the average power input was two times higher. However, it has been shown that the RF coatings require heating the substrate above 400 °C to obtain a crystalline structure, while the HiPIMS method allows for a reduction of the substrate temperature to 300 °C.

Hydrogen gas sensors have recently attracted increased interest due to the explosive nature of H2 and its strategic importance in the sustainable global energy system. In this paper, the tungsten oxide thin films deposited by innovative gas impulse magnetron sputtering have been investigated in terms of their response to H2. It was found that the most favourable annealing temperature in terms of sensor response value, as well as response and recovery times, was achieved at 673 K. This annealing process caused a change in the WO3 cross-section morphology from a featureless and homogenous form to a rather columnar one, but still maintaining the same surface homogeneity. In addition to that, the full-phase transition from an amorphous to nanocrystalline form occurred with a crystallite size of 23 nm. It was found that the sensor response to only 25 ppm of H2 was equal to 6.3, which is one of the best results presented in the literature so far of WO3 optical gas sensors based on a gasochromic effect. Moreover, the results of the gasochromic effect were correlated with the changes in the extinction coefficient and the concentration of the free charge carriers, which is also a novel approach to the understanding of the gasochromic phenomenon.