Explore the vast range of titles available.

Large-size diffraction gratings have played an important role in modern scientific fields such as inertial confinement fusion, large-aperture astronomical telescopes, and high-precision immersion lithography machines with long-stroke displacement stages. However, due to the large size and high accuracy requirements of gratings, and considering the need for high efficiency and low cost, the fabrication of large gratings is extremely difficult. This paper reviews the fabrication technologies for large diffraction gratings, including grating tiling technology, grating ruling technology, single-exposure lithography, optical mosaic grating technology, and scanning beam interference lithography. It introduces the basic principles, representative research, and research progress of these technologies, analyzes their advantages and current problems, and provides reference for the development and optimization of the fabrication technologies of large diffraction gratings.

As sensors, wireless communication devices, personal health monitoring systems, and autonomous microelectromechanical systems (MEMS) become distributed and smaller, there is an increasing demand for miniaturized integrated power sources. Although thin-film batteries are well-suited for on-chip integration, their energy and power per unit area are limited. Three-dimensional electrode designs have potential to offer much greater power and energy per unit area; however, efforts to date to realize 3D microbatteries have led to prototypes with solid electrodes (and therefore low power) or mesostructured electrodes not compatible with manufacturing or on-chip integration. Here, we demonstrate an on-chip compatible method to fabricate high energy density (6.5 μWh cm ⁻²⋅μm ⁻¹) 3D mesostructured Li-ion microbatteries based on LiMnO ₂ cathodes, and NiSn anodes that possess supercapacitor-like power (3,600 μW cm ⁻²⋅μm ⁻¹ peak). The mesostructured electrodes are fabricated by combining 3D holographic lithography with conventional photolithography, enabling deterministic control of both the internal electrode mesostructure and the spatial distribution of the electrodes on the substrate. The resultant full cells exhibit impressive performances, for example a conventional light-emitting diode (LED) is driven with a 500-μA peak current (600-C discharge) from a 10-μm-thick microbattery with an area of 4 mm ² for 200 cycles with only 12% capacity fade. A combined experimental and modeling study where the structural parameters of the battery are modulated illustrates the unique design flexibility enabled by 3D holographic lithography and provides guidance for optimization for a given application. Significance Microscale batteries can deliver energy at the actual point of energy usage, providing capabilities for miniaturizing electronic devices and enhancing their performance. Here, we demonstrate a high-performance microbattery suitable for large-scale on-chip integration with both microelectromechanical and complementary metal-oxide–semiconductor (CMOS) devices. Enabled by a 3D holographic patterning technique, the battery possesses well-defined, periodically mesostructured porous electrodes. Such battery architectures offer both high energy and high power, and the 3D holographic patterning technique offers exceptional control of the electrode’s structural parameters, enabling customized energy and power for specific applications.

Fast, large-scale, and robust 3-dimensional (3D) fabrication techniques for patterning a variety of structures with submicrometer resolution are important in many areas of science and technology such as photonics, electronics, and mechanics with a wide range of applications from tissue engineering to nanoarchitected materials. From several promising 3D manufacturing techniques for realizing different classes of structures suitable for various applications, interference lithography with diffractive masks stands out for its potential to fabricate complex structures at fast speeds. However, the interference lithography masks demonstrated generally suffer from limitations in terms of the patterns that can be generated. To overcome some of these limitations, here we propose the metasurface-mask–assisted 3D nanofabrication which provides great freedom in patterning various periodic structures. To showcase the versatility of this platform, we design metasurface masks that generate exotic periodic lattices like gyroid, rotated cubic, and diamond structures. As a proof of concept, we experimentally demonstrate a diffractive element that can generate the diamond lattice.

The unique diffractive properties of gratings have made them essential in a wide range of applications, including spectral analysis, precision measurement, optical data storage, laser technology, and biomedical imaging. With advancements in micro- and nanotechnologies, the demand for more precise and efficient grating fabrication has increased. This review discusses the latest advancements in grating manufacturing techniques, particularly highlighting laser interference lithography, which excels in sub-beam generation through wavefront and amplitude division. Techniques such as Lloyd’s mirror configurations produce stable interference fringe fields for grating patterning in a single exposure. Orthogonal and non-orthogonal, two-axis Lloyd’s mirror interferometers have advanced the fabrication of two-dimensional gratings and large-area gratings, respectively, while laser interference combined with concave lenses enables the creation of concave gratings. Grating interferometry, utilizing optical interference principles, allows for highly precise measurements of minute displacements at the nanometer to sub-nanometer scale. This review also examines the application of grating interferometry in high-precision, absolute, and multi-degree-of-freedom measurement systems. Progress in grating fabrication has significantly advanced spectrometer technology, with integrated structures such as concave gratings, Fresnel gratings, and grating–microlens arrays driving the miniaturization of spectrometers and expanding their use in compact analytical instruments.

Interference lithography (IL) offers high throughput, excellent uniformity, and maskless patterning capabilities. Compared to other methods, IL enables large-area, cost-effective fabrication of periodic structures with subwavelength resolution, which is particularly valuable for sensing applications, enabling the development of more sensitive, high-resolution, and reliable sensors. This review provides a comprehensive analysis of IL from the perspective of optical field control. We first introduce the principles of interference field formation and summarize key system architectures, including Mach–Zehnder and Lloyd’s mirror configurations, as well as advanced schemes such as multi-beam interference and multi-step exposure for complex pattern generation. We then examine how wavefront engineering, polarization modulation, and phase stabilization influence pattern morphology, contrast, and large-area uniformity. To address dynamic drifts caused by environmental perturbations, both passive vibration isolation and active fringe-locking techniques are discussed. For fringe-locking systems, we review methods for drift monitoring, control algorithms, and feedback implementation. These developments enhance the capability of IL systems to deliver nanoscale accuracy under dynamic conditions, which is essential for stable and high-performance sensing. Looking ahead, IL is evolving into a versatile platform for sensor-oriented nanofabrication. By integrating physical modeling, precision optics, and real-time control, IL provides a robust foundation for advancing next-generation sensing technologies with higher sensitivity, resolution, and reliability.

Micro- and nanopatterning is crucial for advanced photonic, electronic, and sensing devices. Yet achieving large-area periodic nanostructures with a 75 nm half-pitch on low-cost laboratory systems remains difficult, because conventional near-ultraviolet laser interference lithography (LIL) suffers from Gaussian-beam non-uniformity and a narrow exposure latitude. Here, we report a cost-effective deep-ultraviolet (DUV) dual-beam LIL system based on a 266 nm laser and diffractive flat-top beam shaping, enabling large-area patterning of periodical nanostructures. At this wavelength, a moderate half-angle can be chosen to preserve a large beam-overlap region while still delivering 150 nm period (75 nm half-pitch) structures. By independently tuning the incident angle and beam uniformity, we pattern one-dimensional (1D) gratings and two-dimensional (2D) arrays over a Ø 1.0 cm field with critical-dimension variation < 5 nm (1σ), smooth edges, and near-vertical sidewalls. As a proof of concept, we transfer a 2D pattern into Si to create non-metal-coated nanodot arrays that serve as surface-enhanced Raman spectroscopy (SERS) substrates. The arrays deliver an average enhancement factor of ~1.12 × 104 with 11% intensity relative standard deviation (RSD) over 65 sampling points, a performance near the upper limit of all-dielectric SERS substrates. The proposed method overcomes the uneven hotspot distribution and complex fabrication procedures in conventional SERS substrates, enabling reliable and large-area chemical sensing. Compared to electron-beam lithography, the flat-top DUV-LIL approach offers orders-of-magnitude higher throughput at a fraction of the cost, while its centimeter-scale uniformity can be scaled to full wafers with larger beam-shaping optics. These attributes position the method as a versatile and economical route to large-area photonic metasurfaces and sensing devices.

Synchrotron light sources can provide the required spatial coherence, stability and control to support the development of advanced lithography at the extreme ultraviolet and soft X-ray wavelengths that are relevant to current and future fabricating technologies. Here an evaluation of the optical performance of the soft X-ray (SXR) beamline of the Australian Synchrotron (AS) and its suitability for developing interference lithography using radiation in the 91.8 eV (13.5 nm) to 300 eV (4.13 nm) range are presented. A comprehensive physical optics model of the APPLE-II undulator source and SXR beamline was constructed to simulate the properties of the illumination at the proposed location of a photomask, as a function of photon energy, collimation and monochromator parameters. The model is validated using a combination of experimental measurements of the photon intensity distribution of the undulator harmonics. It is shown that the undulator harmonics intensity ratio can be accurately measured using an imaging detector and controlled using beamline optics. Finally, the photomask geometric constraints and achievable performance for the limiting case of fully spatially coherent illumination are evaluated.

In dimensional metrology it is necessary to carry out multi-axis angle and displacement measurement for high-precision positioning. Although the state-of-the-art linear displacement sensors have sub-nanometric measurement resolution, it is not easy to suppress the increase of measurement uncertainty when being applied for multi-axis angle and displacement measurement due to the Abbe errors and the influences of sensor misalignment. In this review article, the state-of-the-art multi-axis optical sensors, such as the three-axis autocollimator, the three-axis planar encoder, and the six-degree-of-freedom planar encoder based on a planar scale grating are introduced. With the employment of grating reflectors, measurement of multi-axis translational and angular displacement can be carried out while employing a single laser beam. Fabrication methods of a large-area planar scale grating based on a single-point diamond cutting with the fast tool servo technique and the interference lithography are also presented, followed by the description of the evaluation method of the large-area planar scale grating based on the Fizeau interferometer.

A microstructure determines macro functionality. A controlled periodic structure gives the surface specific functions such as controlled structural color, wettability, anti-icing/frosting, friction reduction, and hardness enhancement. Currently, there are a variety of controllable periodic structures that can be produced. Laser interference lithography (LIL) is a technique that allows for the simple, flexible, and rapid fabrication of high-resolution periodic structures over large areas without the use of masks. Different interference conditions can produce a wide range of light fields. When an LIL system is used to expose the substrate, a variety of periodic textured structures, such as periodic nanoparticles, dot arrays, hole arrays, and stripes, can be produced. The LIL technique can be used not only on flat substrates, but also on curved or partially curved substrates, taking advantage of the large depth of focus. This paper reviews the principles of LIL and discusses how the parameters, such as spatial angle, angle of incidence, wavelength, and polarization state, affect the interference light field. Applications of LIL for functional surface fabrication, such as anti-reflection, controlled structural color, surface-enhanced Raman scattering (SERS), friction reduction, superhydrophobicity, and biocellular modulation, are also presented. Finally, we present some of the challenges and problems in LIL and its applications.

Surface plasmon resonance is an effect widely used for biosensing. Biosensors based on this effect operate in different configurations, including the use of diffraction gratings as couplers. Gratings are highly tunable and are easy to integrate into a fluidic system due to their planar configuration. We discuss the optimization of plasmonic grating couplers for use in a specific sensor configuration based on the optical switch. These gratings present a sinusoidal profile with a high depth/period ratio. Their interaction with a p-polarized light beam results in two significant diffracted orders (the 0th and the −1st), which enable differential measurements cancelling noise due to common fluctuations. The gratings are fabricated by combining laser interference lithography with nanoimprinting in a process that is aligned with the challenges of low-cost mass production. The effects of different grating parameters such as the period, depth and profile are theoretically and experimentally investigated.