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Metasurface-generated complex 3-dimensional optical fields for interference lithography
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Metasurface-generated complex 3-dimensional optical fields for interference lithography
Metasurface-generated complex 3-dimensional optical fields for interference lithography
Journal Article

Metasurface-generated complex 3-dimensional optical fields for interference lithography

2019
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Overview
Fast, large-scale, and robust 3-dimensional (3D) fabrication techniques for patterning a variety of structures with submicrometer resolution are important in many areas of science and technology such as photonics, electronics, and mechanics with a wide range of applications from tissue engineering to nanoarchitected materials. From several promising 3D manufacturing techniques for realizing different classes of structures suitable for various applications, interference lithography with diffractive masks stands out for its potential to fabricate complex structures at fast speeds. However, the interference lithography masks demonstrated generally suffer from limitations in terms of the patterns that can be generated. To overcome some of these limitations, here we propose the metasurface-mask–assisted 3D nanofabrication which provides great freedom in patterning various periodic structures. To showcase the versatility of this platform, we design metasurface masks that generate exotic periodic lattices like gyroid, rotated cubic, and diamond structures. As a proof of concept, we experimentally demonstrate a diffractive element that can generate the diamond lattice.