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The development of high‐performance electromagnetic wave absorbers is critical for mitigating electromagnetic pollution in modern electronic and communication systems. Here, a scalable strategy is developed to fabricate hierarchically porous, multiphase Si‐based ceramics (Six‐Oy‐Cz) via one‐step activation of carbon‐rich polycarbosilane precursors. The resulting material integrates β‐SiC crystals, amorphous SiOC, and conductive carbon within a tunable porous architecture. This combination creates abundant heterogeneous interfaces, defect structures, and enhanced impedance matching. The optimized sample achieves a minimum reflection loss of −70.44 dB at just 1.79 mm thickness and a broad 4.32 GHz bandwidth at a matching thickness of 1.86 mm. Structural, dielectric, and radar simulation analyses reveal that interfacial polarization, dipolar polarization, conduction loss, and pore‐induced scattering work synergistically to dissipate electromagnetic energy. This work offers a simple, cost‐effective approach to engineer next‐generation ceramic EMW absorbers. A novel multiphase Si‐based ceramic material with hierarchical porosity is devised via one‐step etching activation of carbon‐rich polycarbosilane ceramics. Integrating free carbon, SiC crystals, amorphous SiOC, and engineered porosity, the material surprisingly achieves exceptional electromagnetic absorption performance, offering new insights into the synergistic design of multiphase ceramics and porous architectures.

Summary The aim of this study was to evaluate the cytotoxic effects of one‐step self‐etching adhesives. Cells from an immortalized mouse odontoblast cell line (MDPC‐23) were cultured with six different dental adhesive systems (diluted to concentrations of 0.5% for 4 h): Adper Easy Bond (EB), Xeno V (XV), iBond (IB), AdheSE One (AO), Clearfil SE primer (CS), and Adper Single Bond 2 (SB). MTT (3‐(4,5‐dimethylthiazol‐2‐yl)‐2,5‐diphenyltetrazolium bromide) and flow cytometric apoptosis assays were used to evaluate cell viability and the rate of apoptosis. The odontoblasts were also examined under a scanning electron microscope. While all of the cultures with adhesives showed reduced viability, the viabilities in the IB and SB groups were not significantly different from the control group. Although increased apoptosis rates were observed in all of the cultures with adhesives, the rate in the SB group was not significantly different from the rate in the control. The control group showed the lowest apoptosis rate followed by the SB, AO, IB, EB, XV, and CS groups. When examined under a scanning electron microscope, control odontoblasts and the SB group exhibited relatively large cytoplasmic extensions. In contrast, in the EB and CS groups, fewer fibroblasts remained adhered to the plate surface. Cytoplasmic membrane shrinkage and cell‐free areas with residual membrane fragments from dead cells were observed. In conclusion, all cultures with one‐step self‐etching adhesives showed increased apoptotic activity. SB, an etch‐and‐rinse adhesive, was comparable to the control group, and CS and EB showed the lowest odontoblast viabilities according to the MTT assay. SCANNING 38:36–42, 2016. © 2015 Wiley Periodicals, Inc.

Two-hierarchical nanostructures, characterized by two distinct configurations along the height direction, exhibit immense potential for applications in various fields due to their significantly enhanced controllable degree compared to single-order structures. However, due to the limitations imposed by planar technology, the realization of two-hierarchical nanostructures encounters huge challenges. In this work, we developed a one-step etching method based on inductively coupled plasma reactive ion etching for two-hierarchical nanostructures. Thanks to the shrinking effect of the Cr mask and the generation of a passivation layer during etching, the target materials experienced two different states from vertical etching to shrink etching. Consequently, the achieved two-hierarchical nanostructure configuration features a cross-section of an upper triangle and a lower rectangle, showing higher controllable degrees compared to the one-order ones. Both the mask pattern and etching parameters play crucial roles, by which two-hierarchical structures with diversiform shapes can be constructed controllably. This method for two-hierarchical nanostructures offers advantages including excellent control over structural properties, high processing efficiency, uniformity across large areas, and universality in materials. This developed strategy not only presents a simple and rapid nanofabrication platform for realizing optoelectronic devices, but also provides innovative ideas for designing the next generation of high-performance devices.

The ultra-thin silicon solar devices perform a potential development direction to decrease material usage and thus lowering the expense. The ultra-thin silicon wafer and inverted pyramid structure texturing were completed by one-step Cu-catalyzed chemical etching (CCCE). In this paper, the influence of H 2 O 2 concentration, Cu (NO 3 ) 2 concentration, reaction temperature, and etching time on surface geometry, wafer thickness and light trapping were systematically investigated. The conclusion shows that introduce Cu-particles can significantly accelerate the dissolution of the silicon wafer, the thinning rate of 18 μm/min is more 40-times faster than that of conventional KOH thinning system. Inverted pyramid structure covered thin silicon wafer has ultra-low reflectivity of ~0.5% in the spectrum range of 300~1000 nm. The etching and inverted pyramid structure formation mechanism has finally discussed. The current work develops a new approach for thin silicon manufacturing. Which can be precisely managed by adjusting etching parameters that unlock potential applications in the microelectronics and solar cell market.

This study was performed to standardize a dentin barrier test with the substitute and evaluate the cytotoxicity of one-step self-etching bonding agents. Each of the natural bovine dentin and polyurethane discs were 500-μm thick and were tested using a perfusion device. Following the treatment with 0.05% phenol on the natural bovine disc or three kinds of polyurethane discs—30, 40, and 50 pcf (pounds per cubic foot)—cell viability of L-929 was measured by the 3-(4,5-dimethylthiazol-2-yl)-2,5-diphenyltetrazolium bromide (MTT) assay and expressed as percentages of non-treated group, respectively. A substitute showing permeability similar to that of bovine dentin was determined based on this result. Cytotoxicity test of bonding agents was performed by the selected substitute, the results of which were expressed as percentages of the control. In addition, SEM images were taken after the tests. The cell viability by 40-pcf polyurethane disc was not statistically different from that by bovine dentin disc (P > 0.05). Futurabond DC resulted in the highest cell viability and Bond force the lowest by the 40-pcf polyurethane disc (P < 0.05). The adhesives on the 40-pcf polyurethane disc changed cellular morphology with different degrees on the SEM images. This standardized test might be useful for assessing the cytotoxicity of dental materials applied to dentin before clinical applications.

Three-dimensional (3D) plasmonic metamaterials have become a trend in the application of nanophotonic devices. In this paper, a convenient and inexpensive method for the design of 3D multilayer plasmonic metamaterials is constructed using a one-step self-shielded reactive-ion-etching process (OSRP) and a thermal evaporation system, which provides an efficient and low-cost method for the preparation of surface-enhanced Raman spectroscopy (SERS) substrates. The near-field enhancement of the 3D plasmonic metamaterials provides highly efficient electromagnetic resonance, and highly sensitive and uniform SERS sensing capabilities. The SERS detection results of rhodamine B (Rh. B) and rhodamine 6G (R6G) on this substrate show that the detection limit could reach 10–13 mol/L, and the signal could give expression to excellent uniform stability. The results show that high sensitivity and high robustness SERS substrates can be prepared with high efficiency and low cost.

The aim of the study was to evaluate the clinical performance of two different one-step self-etching adhesives (Hybrid Bond/Sun Medical, Xeno III/Dentsply) in adhesive cervical resin composite restorations. In accordance with a split-mouth study design, 50 patients (57.3 ± 13.5) received at least one pair of restorations. In each of two comparable cervical cavities, either the adhesive systems Hybrid Bond or Xeno III was used with the resin composite Filtek Supreme (3M ESPE). After 6, 12 and 24 months, the restorations were scored according to the Ryge and California Dental Association criteria. After 2 years, the resulting scores (percent) of the Ryge evaluation for the groups Hybrid Bond/ Filtek Supreme and Xeno III/ Filtek Supreme were marginal integrity, Alpha (92/78), Bravo (8/2), Charlie (0/0) and Delta (0/10); anatomic form, Alpha (92/82), Bravo (8/8) and Charlie (0/10); secondary caries, Alpha (100/100) and Bravo (0/0); marginal discoloration, Alpha (80/84), Bravo (20/12), Charlie (0/0) and not available (0/4); color match, Oscar (39/47), Alpha (51/45), Bravo (10/4), Charlie (0/0) and not available (0/4); surface, Romeo (78/69), Sierra (22/22), Tango (0/0) and Victor (0/10); tooth vitality, Alpha (98/94), Bravo (2/6); and integrity of tooth, alpha 1 (96/96) and alpha 2 (4/4). After 2 years, all Hybrid Bond restorations were retained and showed clinically acceptable results, while five Xeno III restorations were lost in part or in toto. For marginal integrity, anatomic form and surface, significant differences ( p  < 0.05) were found but did not prove statistically significant after Bonferroni adjustment.

This paper presents the dry etching characteristics of indium tin oxide (ITO)/Ag/ITO multilayered thin film, used as a pixel electrode in a high-resolution active-matrix organic light-emitting diode (AMOLED) device. Dry etching was performed using a combination of H2 and HCl gases in a reactive ion etching system with a remote electron cyclotron resonance (ECR) plasma source, in order to achieve high electron temperature. The effect of the gas ratio (H2/HCl) was closely observed, in order to achieve an optimal etch profile and an effective etch process, while other parameters—such as the radio frequency (RF) power, ECR power, chamber pressure, and temperature—were fixed. The optimized process, with an appropriate gas ratio, constitutes a one-step serial dry etch solution for ITO and Ag multilayered thin films.

Purpose This study aims to review the current one-step electrodeposition of superhydrophobic coatings on metal surfaces. Design/methodology/approach One-step electrodeposition is a versatile and simple technology to prepare superhydrophobic coatings on metal surfaces. Findings Preparing superhydrophobic coatings by one-step electrodeposition is an efficient method to protect metal surfaces. Originality/value Even though there are several technologies, one-step electrodeposition still plays a significant role in producing superhydrophobic coatings.

For commercial processes, through-hole AAO membranes are fabricated from high-purity aluminum by chemical etching. However, this method has the disadvantages of using heavy-metal solutions, creating large amounts of material waste, and leading to an irregular pore structure. Through-hole porous alumina membrane fabrication has been widely investigated due to applications in filters, nanomaterial synthesis, and surface-enhanced Raman scattering. There are several means to obtain freestanding through-hole AAO membranes, but a fast, low-cost, and repetitive process to create complete, high-quality membranes has not yet been established. Here, we propose a rapid and efficient method for the multi-detachment of an AAO membrane at room temperature by integrating the one-time potentiostatic (OTP) method and two-step electrochemical polishing. Economical commercial AA1050 was used instead of traditional high-cost high-purity aluminum for AAO membrane fabrication at 25 °C. The OTP method, which is a single-step process, was applied to achieve a high-quality membrane with unimodal pore distribution and diameters between 35 and 40 nm, maintaining a high consistency over five repetitions. To repeatedly detach the AAO membrane, two-step electrochemical polishing was developed to minimize damage on the AA1050 substrate caused by membrane separation. The mechanism for creating AAO membranes using the OTP method can be divided into three major components, including the Joule heating effect, the dissolution of the barrier layer, and stress effects. The stress is attributed to two factors: bubble formation and the difference in the coefficient of thermal expansion between the AAO membrane and the Al substrate. This highly efficient AAO membrane detachment method will facilitate the rapid production and applications of AAO films.