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PTFE surface etching in the post-discharge of a RF scanning plasma torch: evidence of ejected fluorinated species
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PTFE surface etching in the post-discharge of a RF scanning plasma torch: evidence of ejected fluorinated species
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PTFE surface etching in the post-discharge of a RF scanning plasma torch: evidence of ejected fluorinated species
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Paper
PTFE surface etching in the post-discharge of a RF scanning plasma torch: evidence of ejected fluorinated species
2016
Overview
The texturization of poly(tetrafluoroethylene) (PTFE) surfaces is achieved at atmospheric pressure by using the post-discharge of a radio-frequency plasma torch supplied in helium and oxygen gases. The surface properties are characterized by contact angle measurement, X-ray photoelectron spectroscopy and atomic force microscopy. We show that the plasma treatment increases the surface hydrophobicity (with water contact angles increasing from 115 to 155{\\deg}) only by modifying the PTFE surface morphology and not the stoichiometry. Measurements of sample mass losses correlated to the ejection of CF\\(_2\\) fragments from the PTFE surface evidenced an etching mechanism at atmospheric pressure.
