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Analysis of Organometallic Compounds and Metallic Particles in Specialty Gases by Direct Injection Using Gas Exchange Device (GED) Coupled to Inductively Coupled Plasma–Mass Spectrometry (ICP-MS)
by
Merrifield, Ruth
, Hineman, Aaron
, Stephan, Chady
in
Accuracy
/ Aerosols
/ Artificial intelligence
/ Calibration
/ Carbon monoxide
/ Data analysis
/ Electronics industry
/ Gas exchange
/ Gas flow
/ Gases
/ Impurities
/ Inductively coupled plasma mass spectrometry
/ Manufacturing
/ Mass spectrometry
/ Mass spectroscopy
/ Metal particles
/ Organometallic compounds
/ Plasma etching
/ Sample preparation
/ Scientific imaging
/ Toxicity
/ Workflow
2024
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Analysis of Organometallic Compounds and Metallic Particles in Specialty Gases by Direct Injection Using Gas Exchange Device (GED) Coupled to Inductively Coupled Plasma–Mass Spectrometry (ICP-MS)
by
Merrifield, Ruth
, Hineman, Aaron
, Stephan, Chady
in
Accuracy
/ Aerosols
/ Artificial intelligence
/ Calibration
/ Carbon monoxide
/ Data analysis
/ Electronics industry
/ Gas exchange
/ Gas flow
/ Gases
/ Impurities
/ Inductively coupled plasma mass spectrometry
/ Manufacturing
/ Mass spectrometry
/ Mass spectroscopy
/ Metal particles
/ Organometallic compounds
/ Plasma etching
/ Sample preparation
/ Scientific imaging
/ Toxicity
/ Workflow
2024
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Analysis of Organometallic Compounds and Metallic Particles in Specialty Gases by Direct Injection Using Gas Exchange Device (GED) Coupled to Inductively Coupled Plasma–Mass Spectrometry (ICP-MS)
by
Merrifield, Ruth
, Hineman, Aaron
, Stephan, Chady
in
Accuracy
/ Aerosols
/ Artificial intelligence
/ Calibration
/ Carbon monoxide
/ Data analysis
/ Electronics industry
/ Gas exchange
/ Gas flow
/ Gases
/ Impurities
/ Inductively coupled plasma mass spectrometry
/ Manufacturing
/ Mass spectrometry
/ Mass spectroscopy
/ Metal particles
/ Organometallic compounds
/ Plasma etching
/ Sample preparation
/ Scientific imaging
/ Toxicity
/ Workflow
2024
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Analysis of Organometallic Compounds and Metallic Particles in Specialty Gases by Direct Injection Using Gas Exchange Device (GED) Coupled to Inductively Coupled Plasma–Mass Spectrometry (ICP-MS)
Magazine Article
Analysis of Organometallic Compounds and Metallic Particles in Specialty Gases by Direct Injection Using Gas Exchange Device (GED) Coupled to Inductively Coupled Plasma–Mass Spectrometry (ICP-MS)
2024
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Overview
In this article, we introduce the concept of a gas exchange device (GED) and how it can be used to monitor organometallic compounds and metallic particles in specialty gases. The GED–inductively coupled plasma–mass spectrometry (GED–ICP-MS) workflow eliminates the need for any offline sample preparation, making it the ideal tool for online metallic impurities monitoring. This technology can be deployed to monitor specialty gas impurities in process chemicals at delivery, distribution points, and point of use.
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