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Microstructure evolution in amorphous Hf-B-Si-C-N high temperature resistant coatings after annealing to 1500 °C in air
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Microstructure evolution in amorphous Hf-B-Si-C-N high temperature resistant coatings after annealing to 1500 °C in air
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Journal Article
Microstructure evolution in amorphous Hf-B-Si-C-N high temperature resistant coatings after annealing to 1500 °C in air
2019
Overview
Recently, amorphous Hf-B-Si-C-N coatings found to demonstrate superior high-temperature oxidation resistance. The microstructure evolution of two coatings, Hf
7
B
23
Si
22
C
6
N
40
and Hf
6
B
21
Si
19
C
4
N
47
, annealed to 1500 °C in air is investigated to understand their high oxidation resistance. The annealed coatings develop a two-layered structure comprising of the original as-deposited film followed by an oxidized layer. In both films, the oxidized layer possesses the same microstructure with HfO
2
nanoparticles dispersed in an amorphous SiO
x
-based matrix. The bottom layer in the Hf
6
B
21
Si
19
C
4
N
47
coating remains amorphous after annealing while Hf
7
B
23
Si
22
C
6
N
40
recrystallized partially showing a nanocrystalline structure of HfB
2
and HfN nanoparticles separated by h-Si
3
N
4
and h-BN boundaries. The HfB
2
and HfN nanostructures form a sandwich structure with a HfB
2
strip being atomically coherent to HfN skins via (111)-Hf monolayers. In spite of the different bottom layer structure, the oxidized/bottom layer interface of both films was found to exhibit a similar microstructure with a fine distribution of HfO
2
nanoparticles surrounded by SiO
2
quartz boundaries. The high-temperature oxidation resistance of both films is attributed to the particular evolving microstructure consisting of HfO
2
nanoparticles within a dense SiO
x
-based matrix and quartz SiO
2
in front of the oxidized/bottom layer interface acting as a barrier for oxygen and thermal diffusion.
Publisher
Nature Publishing Group UK,Nature Publishing Group
Subject
