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Dipole-Driven Charge Trapping in Monolayer Janus MoSSe for Ultrathin Nonvolatile Memory Devices
Dipole-Driven Charge Trapping in Monolayer Janus MoSSe for Ultrathin Nonvolatile Memory Devices
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Dipole-Driven Charge Trapping in Monolayer Janus MoSSe for Ultrathin Nonvolatile Memory Devices
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Dipole-Driven Charge Trapping in Monolayer Janus MoSSe for Ultrathin Nonvolatile Memory Devices
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Dipole-Driven Charge Trapping in Monolayer Janus MoSSe for Ultrathin Nonvolatile Memory Devices
Dipole-Driven Charge Trapping in Monolayer Janus MoSSe for Ultrathin Nonvolatile Memory Devices
Journal Article

Dipole-Driven Charge Trapping in Monolayer Janus MoSSe for Ultrathin Nonvolatile Memory Devices

2026
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Overview
Highlights Janus MoSSe-based floating-gate memory exhibits ultrafast charge-trapping dynamics and stable charge retention exceeding 10 8  s under low-voltage operation. The intrinsic out-of-plane dipole moment in Janus MoSSe effectively suppresses leakage current and enlarges the memory window, even with ultrathin h-BN tunneling layers. The proposed all-van der Waals heterostructure provides a scalable platform for high-speed, energy-efficient, and reliable nonvolatile memory applications. The continued scaling of flash memory technologies faces challenges such as limited operation speed, poor data retention, and interface defects inherent to conventional three-dimensional architectures. Two-dimensional (2D) materials, with van der Waals interfaces and atomic-scale thickness, offer a promising pathway to overcome these limitations by enabling efficient charge modulation while minimizing surface defects. In this work, a nonvolatile 2D flash memory device is developed employing monolayer Janus MoSSe as the charge-trapping layer and hexagonal boron nitride (h-BN) as an ultrathin tunneling barrier. The intrinsic structural asymmetry of Janus MoSSe induces a strong vertical dipole moment, resulting in enhanced charge trapping, deeper energy barriers, and directional polarization compared with symmetric 2D materials. Consequently, the devices exhibit outstanding retention times exceeding 10 4  s, endurance beyond 10 4 program/erase cycles, and large memory window ratios (Δ V / V G,max of 50%–70% for 10 and 6 nm h-BN, respectively), with charge-trapping rates up to 8.96 × 10 14  cm −2  s −1 . In addition, Janus MoSSe-based devices show synaptic characteristics under electrical pulses and perform recognition simulations in artificial neural networks. These findings establish a design paradigm for 2D memory devices, enabling ultrathin, flexible, and energy-efficient nonvolatile memories.