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result(s) for
"Śmigiel, Jan Mikołaj"
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Near-critical Stranski-Krastanov growth of InAs/InP quantum dots
by
Syperek, Marcin
,
Śmigiel, Jan Mikołaj
,
Semenova, Elizaveta
in
639/624/399/1017
,
639/925/357/1017
,
Annealing
2024
This work shows how to control the surface density and size of InAs/InP quantum dots over a wide range by tailoring the conditions of Stranski-Krastanov growth. We demonstrate that in the near-critical growth regime, the density of quantum dots can be tuned between
10
7
and
10
10
cm
-
2
. Furthermore, employing both experimental and modeling approaches, we show that the size (and therefore the emission wavelength) of InAs nanoislands on InP can be controlled independently from their surface density. Finally, we demonstrate that our growth method gives low-density ensembles with well-isolated QD-originated emission lines in the telecom C-band.
Journal Article
Efficient passivation of III-As(P) photonic interfaces
by
Zięba-Ostój, Emilia
,
Huck, Alexander
,
Syperek, Marcin
in
Annealing
,
Charge density
,
Encapsulation
2025
Surface effects can significantly impact the performance of nanophotonic and quantum photonic devices, especially as the device dimensions are reduced. In this work, we propose and investigate a novel approach to surface passivation to mitigate these challenges in photonic nanostructures with III-As(P) quantum wells defined by a dry etching process. The nanostructures are annealed under the phosphine (PH\\(_3\\)) ambient inside a metal-organic vapor phase epitaxy chamber to eliminate surface and subsurface defects induced during the dry etching and subsequent oxidation of the etched sidewalls. Moreover, encapsulation of the active material with a wider bandgap material allows for maintaining the band structure of the device, mitigating band bending effects. Our findings reveal an almost order of magnitude reduction in the surface recombination velocity from \\(2 10^3 \\, cm/s\\) for the PH\\(_3\\) annealing compared to \\(1.5 10^4 \\, cm/s\\) for the non-passivated structures and \\(5 10^3 \\, cm/s\\) for the standard method based on (NH\\(_4\\))\\(_2\\)S wet treatment followed by Al\\(_2\\)O\\(_3\\) encapsulation. A further reduction to \\(5 10^2 \\, cm/s\\) is achieved for the InP-regrown samples. Additionally, we develop a model accounting for the impact of surface charges in the analysis of time-resolved photoluminescence curves and demonstrate that the proposed passivation method effectively reduces the surface charge density on the sidewalls of the studied quantum well-based photonic nanostructures.
Fine-tunable near-critical Stranski-Krastanov growth of InAs/InP quantum dots
2023
Emerging applications of self-assembled semiconductor quantum dot (QD)-based nonclassical light sources emitting in the telecom C-band (1530 to 1565 nm) present challenges in terms of controlled synthesis of their low-density ensembles, critical for device processing with an isolated QD. This work shows how to control the surface density and size of InAs/InP quantum dots over a wide range by tailoring the conditions of Stranski-Krastanow growth. We demonstrate that in the near-critical growth regime, the density of quantum dots can be tuned between \\(10^7\\) and \\(10^10 cm^-2\\). Furthermore, employing both experimental and modeling approaches, we show that the size (and therefore the emission wavelength) of InAs nanoislands on InP can be controlled independently from their surface density. Finally, we demonstrate that our growth method gives low-density ensembles resulting in well-isolated QD-originated emission lines in the telecom C-band.