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Progress in the Circular Arc Source Structure and Magnetic Field Arc Control Technology for Arc Ion Plating
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Progress in the Circular Arc Source Structure and Magnetic Field Arc Control Technology for Arc Ion Plating
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Journal Article
Progress in the Circular Arc Source Structure and Magnetic Field Arc Control Technology for Arc Ion Plating
2025
Overview
Aiming at the goal of preparing high-quality coatings, this paper reviews the progress on circular arc source structure and magnetic field arc controlling technology in arc ion plating (AIP), with a focus on design characteristics of the different structures and configuration optimization of the corresponding magnetic fields. The circular arc source, due to its simple structure, convenient installation, flexible target combination, high cooling efficiency, and high ionization rate and deposition rate, has shown significant application potential in AIP technology. In terms of magnetic field arc controlling technology, this paper delves into the design progress of various magnetic field configurations, including fixed magnetic fields generated by permanent magnets, dynamic rotating magnetic fields, axially symmetric magnetic fields, rotating transverse magnetic fields, and multi-mode alternating electromagnetic coupling fields. By designing the magnetic field distribution reasonably, the trajectory and velocity of the arc spot can be controlled precisely, thus reducing the generation of macroparticles, improving target utilization, and enhancing coating uniformity. In particular, the introduction of multi-mode magnetic field coupling technology has broken through the limitations of traditional single magnetic field structures, achieving comprehensive optimization of arc spot motion and plasma transport. Hopefully, these research advances provide an important theoretical basis and technical support for the application of AIP technology in the preparation for high-quality decorative and functional coatings.
Publisher
MDPI AG,MDPI
Subject
