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Approaching the quantum limit in two-dimensional semiconductor contacts
by
Ning, Hongkai
, Ma, Liang
, Lu, Junpeng
, Shi, Yi
, Yu, Zhihao
, Wang, Wenhui
, Nie, Yuefeng
, Ni, Zhenhua
, Li, Taotao
, Gao, Si
, Fan, Dongxu
, Tu, Xuecou
, Xu, Tao
, Li, Weisheng
, Xu, Yifei
, Sun, Litao
, Wang, Peng
, Wang, Xinran
, Wang, Wenfeng
, Duan, Xidong
, Liu, Lei
, Li, Jia
, Pop, Eric
, Qiu, Hao
, Sun, Wenjie
, Wang, Jinlan
, Köroğlu, Çağıl
, Gong, Xiaoshu
in
639/925/357/1018
/ 639/925/927/1007
/ Antimony
/ Chalcogenides
/ Chemical bonds
/ CMOS
/ Contact resistance
/ Electric contacts
/ Electrical junctions
/ Electronics
/ Energy bands
/ Humanities and Social Sciences
/ Hybridization
/ Low dimensional semiconductors
/ Metals
/ Molybdenum
/ Molybdenum disulfide
/ multidisciplinary
/ Science
/ Science (multidisciplinary)
/ Semiconductor devices
/ Semiconductor junctions
/ Silicon
/ Spectrum analysis
/ Stability
/ Threshold voltage
/ Transistors
/ Transition metal compounds
2023
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Approaching the quantum limit in two-dimensional semiconductor contacts
by
Ning, Hongkai
, Ma, Liang
, Lu, Junpeng
, Shi, Yi
, Yu, Zhihao
, Wang, Wenhui
, Nie, Yuefeng
, Ni, Zhenhua
, Li, Taotao
, Gao, Si
, Fan, Dongxu
, Tu, Xuecou
, Xu, Tao
, Li, Weisheng
, Xu, Yifei
, Sun, Litao
, Wang, Peng
, Wang, Xinran
, Wang, Wenfeng
, Duan, Xidong
, Liu, Lei
, Li, Jia
, Pop, Eric
, Qiu, Hao
, Sun, Wenjie
, Wang, Jinlan
, Köroğlu, Çağıl
, Gong, Xiaoshu
in
639/925/357/1018
/ 639/925/927/1007
/ Antimony
/ Chalcogenides
/ Chemical bonds
/ CMOS
/ Contact resistance
/ Electric contacts
/ Electrical junctions
/ Electronics
/ Energy bands
/ Humanities and Social Sciences
/ Hybridization
/ Low dimensional semiconductors
/ Metals
/ Molybdenum
/ Molybdenum disulfide
/ multidisciplinary
/ Science
/ Science (multidisciplinary)
/ Semiconductor devices
/ Semiconductor junctions
/ Silicon
/ Spectrum analysis
/ Stability
/ Threshold voltage
/ Transistors
/ Transition metal compounds
2023
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Approaching the quantum limit in two-dimensional semiconductor contacts
by
Ning, Hongkai
, Ma, Liang
, Lu, Junpeng
, Shi, Yi
, Yu, Zhihao
, Wang, Wenhui
, Nie, Yuefeng
, Ni, Zhenhua
, Li, Taotao
, Gao, Si
, Fan, Dongxu
, Tu, Xuecou
, Xu, Tao
, Li, Weisheng
, Xu, Yifei
, Sun, Litao
, Wang, Peng
, Wang, Xinran
, Wang, Wenfeng
, Duan, Xidong
, Liu, Lei
, Li, Jia
, Pop, Eric
, Qiu, Hao
, Sun, Wenjie
, Wang, Jinlan
, Köroğlu, Çağıl
, Gong, Xiaoshu
in
639/925/357/1018
/ 639/925/927/1007
/ Antimony
/ Chalcogenides
/ Chemical bonds
/ CMOS
/ Contact resistance
/ Electric contacts
/ Electrical junctions
/ Electronics
/ Energy bands
/ Humanities and Social Sciences
/ Hybridization
/ Low dimensional semiconductors
/ Metals
/ Molybdenum
/ Molybdenum disulfide
/ multidisciplinary
/ Science
/ Science (multidisciplinary)
/ Semiconductor devices
/ Semiconductor junctions
/ Silicon
/ Spectrum analysis
/ Stability
/ Threshold voltage
/ Transistors
/ Transition metal compounds
2023
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Approaching the quantum limit in two-dimensional semiconductor contacts
Journal Article
Approaching the quantum limit in two-dimensional semiconductor contacts
2023
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Overview
The development of next-generation electronics requires scaling of channel material thickness down to the two-dimensional limit while maintaining ultralow contact resistance
1
,
2
. Transition-metal dichalcogenides can sustain transistor scaling to the end of roadmap, but despite a myriad of efforts, the device performance remains contact-limited
3
–
12
. In particular, the contact resistance has not surpassed that of covalently bonded metal–semiconductor junctions owing to the intrinsic van der Waals gap, and the best contact technologies are facing stability issues
3
,
7
. Here we push the electrical contact of monolayer molybdenum disulfide close to the quantum limit by hybridization of energy bands with semi-metallic antimony (
01
1
̅
2
) through strong van der Waals interactions. The contacts exhibit a low contact resistance of 42 ohm micrometres and excellent stability at 125 degrees Celsius. Owing to improved contacts, short-channel molybdenum disulfide transistors show current saturation under one-volt drain bias with an on-state current of 1.23 milliamperes per micrometre, an on/off ratio over 10
8
and an intrinsic delay of 74 femtoseconds. These performances outperformed equivalent silicon complementary metal–oxide–semiconductor technologies and satisfied the 2028 roadmap target. We further fabricate large-area device arrays and demonstrate low variability in contact resistance
,
threshold voltage, subthreshold swing, on/off ratio, on-state current and transconductance
13
. The excellent electrical performance, stability and variability make antimony (
01
1
̅
2
) a promising contact technology for transition-metal-dichalcogenide-based electronics beyond silicon.
The electrical contact of two-dimensional transistors is pushed close to the quantum limit by hybridization of the energy bands with antimony; the contacts have low contact resistance and excellent stability.
Publisher
Nature Publishing Group UK,Nature Publishing Group
Subject
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