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A novel ultra-steep subthreshold swing iTFET with control gate and control source biasing
by
Lin, Jyi-Tsong
, Tu, Ruei-Cheng
in
639/166
/ 639/166/987
/ Advanced manufacturing technologies
/ Architecture
/ Business metrics
/ Control source
/ Design
/ Efficiency
/ Electric fields
/ Fabrication
/ Humanities and Social Sciences
/ I ON/I OFF ratio
/ Innovations
/ Line tunneling
/ multidisciplinary
/ Schottky barrier
/ Science
/ Science (multidisciplinary)
/ Simulation
/ Subthreshold swing (SS)
/ Technological change
/ Transistors
/ Tunnel field-effect transistor (TFET)
2025
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A novel ultra-steep subthreshold swing iTFET with control gate and control source biasing
by
Lin, Jyi-Tsong
, Tu, Ruei-Cheng
in
639/166
/ 639/166/987
/ Advanced manufacturing technologies
/ Architecture
/ Business metrics
/ Control source
/ Design
/ Efficiency
/ Electric fields
/ Fabrication
/ Humanities and Social Sciences
/ I ON/I OFF ratio
/ Innovations
/ Line tunneling
/ multidisciplinary
/ Schottky barrier
/ Science
/ Science (multidisciplinary)
/ Simulation
/ Subthreshold swing (SS)
/ Technological change
/ Transistors
/ Tunnel field-effect transistor (TFET)
2025
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A novel ultra-steep subthreshold swing iTFET with control gate and control source biasing
by
Lin, Jyi-Tsong
, Tu, Ruei-Cheng
in
639/166
/ 639/166/987
/ Advanced manufacturing technologies
/ Architecture
/ Business metrics
/ Control source
/ Design
/ Efficiency
/ Electric fields
/ Fabrication
/ Humanities and Social Sciences
/ I ON/I OFF ratio
/ Innovations
/ Line tunneling
/ multidisciplinary
/ Schottky barrier
/ Science
/ Science (multidisciplinary)
/ Simulation
/ Subthreshold swing (SS)
/ Technological change
/ Transistors
/ Tunnel field-effect transistor (TFET)
2025
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A novel ultra-steep subthreshold swing iTFET with control gate and control source biasing
Journal Article
A novel ultra-steep subthreshold swing iTFET with control gate and control source biasing
2025
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Overview
In this paper, we propose a novel structure with Control Source and Control Gate structured tunnel field-effect transistor (CSCG‑iTFET), which achieves an unprecedentedly steep subthreshold swing (SS) while maintaining high ON-state current (
). In addition, using Schottky contacts at the source without doping reduces leakage current and thermal budget. We compared the performance of four different device structures, including conventional Double Gate TFET with Control Gate, iTFET with Control Gate, iTFET with Charge Enhancement Layer and Control Gate, and our structure. The accumulation layer can be enhanced by using the characteristic of Control Source to modulate the voltage. We performed simulation studies using Sentaurus TCAD. Utilize calibrated models for accurate simulations, exploiting the same referenced processes, demonstrate that the Control Source iTFET exhibits an average subthreshold swing
S.S
AVG
of 9.69 mV/Dec and a minimum subthreshold swing
S.S
MIN
of 1.72 mV/Dec, respectively. At
V
D
= 0.2 V, the
I
ON
current is 2.95 × 10
− 7
A/µm, and the
I
ON
/
I
OFF
ratio is 3.84 × 10
9
. It is believed that the performance can be further improved if the fabrication processes are optimized.
Publisher
Nature Publishing Group UK,Nature Publishing Group,Nature Portfolio
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