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Monitoring dopants by Raman scattering in an electrochemically top-gated graphene transistor
Monitoring dopants by Raman scattering in an electrochemically top-gated graphene transistor
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Monitoring dopants by Raman scattering in an electrochemically top-gated graphene transistor
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Monitoring dopants by Raman scattering in an electrochemically top-gated graphene transistor
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Monitoring dopants by Raman scattering in an electrochemically top-gated graphene transistor
Monitoring dopants by Raman scattering in an electrochemically top-gated graphene transistor
Journal Article

Monitoring dopants by Raman scattering in an electrochemically top-gated graphene transistor

2008
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Overview
The recent discovery of graphene 1 , 2 , 3 has led to many advances in two-dimensional physics and devices 4 , 5 . The graphene devices fabricated so far have relied on SiO 2 back gating 1 , 2 , 3 . Electrochemical top gating is widely used for polymer transistors 6 , 7 , and has also been successfully applied to carbon nanotubes 8 , 9 . Here we demonstrate a top-gated graphene transistor that is able to reach doping levels of up to 5×10 13  cm −2 , which is much higher than those previously reported. Such high doping levels are possible because the nanometre-thick Debye layer 8 , 10 in the solid polymer electrolyte gate provides a much higher gate capacitance than the commonly used SiO 2 back gate, which is usually about 300 nm thick 11 . In situ Raman measurements monitor the doping. The G peak stiffens and sharpens for both electron and hole doping, but the 2D peak shows a different response to holes and electrons. The ratio of the intensities of the G and 2D peaks shows a strong dependence on doping, making it a sensitive parameter to monitor the doping.