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Monitoring dopants by Raman scattering in an electrochemically top-gated graphene transistor
by
Saha, S. K.
, Novoselov, K. S.
, Das, A.
, Pisana, S.
, Krishnamurthy, H. R.
, Piscanec, S.
, Sood, A. K.
, Waghmare, U. V.
, Ferrari, A. C.
, Chakraborty, B.
, Geim, A. K.
in
Carbon - chemistry
/ Chemistry and Materials Science
/ Electrochemistry
/ Electrochemistry - methods
/ Electrolytes
/ Equipment Failure Analysis - methods
/ Graphene
/ letter
/ Materials Science
/ Materials Testing
/ Nanostructures - chemistry
/ Nanostructures - ultrastructure
/ Nanotechnology
/ Nanotechnology - instrumentation
/ Nanotechnology - methods
/ Nanotechnology and Microengineering
/ Particle Size
/ Physics
/ Polymers
/ Spectrum Analysis, Raman - methods
/ Transistors
/ Transistors, Electronic
2008
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Monitoring dopants by Raman scattering in an electrochemically top-gated graphene transistor
by
Saha, S. K.
, Novoselov, K. S.
, Das, A.
, Pisana, S.
, Krishnamurthy, H. R.
, Piscanec, S.
, Sood, A. K.
, Waghmare, U. V.
, Ferrari, A. C.
, Chakraborty, B.
, Geim, A. K.
in
Carbon - chemistry
/ Chemistry and Materials Science
/ Electrochemistry
/ Electrochemistry - methods
/ Electrolytes
/ Equipment Failure Analysis - methods
/ Graphene
/ letter
/ Materials Science
/ Materials Testing
/ Nanostructures - chemistry
/ Nanostructures - ultrastructure
/ Nanotechnology
/ Nanotechnology - instrumentation
/ Nanotechnology - methods
/ Nanotechnology and Microengineering
/ Particle Size
/ Physics
/ Polymers
/ Spectrum Analysis, Raman - methods
/ Transistors
/ Transistors, Electronic
2008
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Monitoring dopants by Raman scattering in an electrochemically top-gated graphene transistor
by
Saha, S. K.
, Novoselov, K. S.
, Das, A.
, Pisana, S.
, Krishnamurthy, H. R.
, Piscanec, S.
, Sood, A. K.
, Waghmare, U. V.
, Ferrari, A. C.
, Chakraborty, B.
, Geim, A. K.
in
Carbon - chemistry
/ Chemistry and Materials Science
/ Electrochemistry
/ Electrochemistry - methods
/ Electrolytes
/ Equipment Failure Analysis - methods
/ Graphene
/ letter
/ Materials Science
/ Materials Testing
/ Nanostructures - chemistry
/ Nanostructures - ultrastructure
/ Nanotechnology
/ Nanotechnology - instrumentation
/ Nanotechnology - methods
/ Nanotechnology and Microengineering
/ Particle Size
/ Physics
/ Polymers
/ Spectrum Analysis, Raman - methods
/ Transistors
/ Transistors, Electronic
2008
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Monitoring dopants by Raman scattering in an electrochemically top-gated graphene transistor
Journal Article
Monitoring dopants by Raman scattering in an electrochemically top-gated graphene transistor
2008
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Overview
The recent discovery of graphene
1
,
2
,
3
has led to many advances in two-dimensional physics and devices
4
,
5
. The graphene devices fabricated so far have relied on SiO
2
back gating
1
,
2
,
3
. Electrochemical top gating is widely used for polymer transistors
6
,
7
, and has also been successfully applied to carbon nanotubes
8
,
9
. Here we demonstrate a top-gated graphene transistor that is able to reach doping levels of up to 5×10
13
cm
−2
, which is much higher than those previously reported. Such high doping levels are possible because the nanometre-thick Debye layer
8
,
10
in the solid polymer electrolyte gate provides a much higher gate capacitance than the commonly used SiO
2
back gate, which is usually about 300 nm thick
11
.
In situ
Raman measurements monitor the doping. The G peak stiffens and sharpens for both electron and hole doping, but the 2D peak shows a different response to holes and electrons. The ratio of the intensities of the G and 2D peaks shows a strong dependence on doping, making it a sensitive parameter to monitor the doping.
Publisher
Nature Publishing Group UK,Nature Publishing Group
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