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A highly CMOS compatible hafnia-based ferroelectric diode
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A highly CMOS compatible hafnia-based ferroelectric diode
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Journal Article
A highly CMOS compatible hafnia-based ferroelectric diode
2020
Overview
Memory devices with high speed and high density are highly desired to address the ‘memory wall’ issue. Here we demonstrated a highly scalable, three-dimensional stackable ferroelectric diode, with its rectifying polarity modulated by the polarization reversal of Hf
0.5
Zr
0.5
O
2
films. By visualizing the hafnium/zirconium lattice order and oxygen lattice order with atomic-resolution spherical aberration-corrected STEM, we revealed the correlation between the spontaneous polarization of Hf
0.5
Zr
0.5
O
2
film and the displacement of oxygen atom, thus unambiguously identified the non-centrosymmetric Pca2
1
orthorhombic phase in Hf
0.5
Zr
0.5
O
2
film. We further implemented this ferroelectric diode in an 8 layers 3D array. Operation speed as high as 20 ns and robust endurance of more than 10
9
were demonstrated. The built-in nonlinearity of more than 100 guarantees its self-selective property that eliminates the need for external selectors to suppress the leakage current in large array. This work opens up new opportunities for future memory hierarchy evolution.
Designing reliable, scalable and high speed computing systems remains a challenge. Here, the authors identify noncentrosymmetric orthorhombic phase in HZO film and demonstrate a CMOS compatible 3D Vertical HZO-based ferroelectric diode array with self-selective property and 20 ns of speed operation.
