Journal Article

ToF-SIMS 3D Analysis of Thin Films Deposited in High Aspect Ratio Structures via Atomic Layer Deposition and Chemical Vapor Deposition

Mart, Clemens, Utriainen, Mikko, Esmaeili, Sajjad, Kia, Alireza M., Haufe, Nora, Weinreich, Wenke, Puurunen, Riikka L.

2019

Overview

For the analysis of thin films, with high aspect ratio (HAR) structures, time-of-flight secondary ion mass spectrometry (ToF-SIMS) overcomes several challenges in comparison to other frequently used techniques such as electron microscopy. The research presented herein focuses on two different kinds of HAR structures that represent different semiconductor technologies. In the first study, ToF-SIMS is used to illustrate cobalt seed layer corrosion by the copper electrolyte within the large through-silicon-vias (TSVs) before and after copper electroplating. However, due to the sample’s surface topography, ToF-SIMS analysis proved to be difficult due to the geometrical shadowing effects. Henceforth, in the second study, we introduce a new test platform to eliminate the difficulties with the HAR structures, and again, use ToF-SIMS for elemental analysis. We use data image slicing of 3D ToF-SIMS analysis combined with lateral HAR test chips (PillarHall™) to study the uniformity of silicon dopant concentration in atomic layer deposited (ALD) HfO2 thin films.

• Publisher: MDPI AG,MDPI
• Subject: Atomic layer epitaxy / Chemical vapor deposition / Cobalt / compositional depth profiling / Copper / Corrosion / Electrolytes / Electron microscopy / Electroplating / Hafnium oxide / High aspect ratio / high aspect ratio (HAR) structures / Image processing / Ions / lateral high aspect ratio (LHAR) / Mass spectrometry / Mass spectroscopy / Measurement techniques / Microscopy / Organic chemicals / Organic chemistry / Scientific imaging / Secondary ion mass spectrometry / Silicon / silicon doped hafnium oxide (HSO) ALD deposition / Silicon wafers / Slicing / Thin films / ToF-SIMS 3D imaging / ToF-SIMS analysis