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Risks, Release and Concentrations of Engineered Nanomaterial in the Environment
Risks, Release and Concentrations of Engineered Nanomaterial in the Environment
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Risks, Release and Concentrations of Engineered Nanomaterial in the Environment
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Risks, Release and Concentrations of Engineered Nanomaterial in the Environment
Risks, Release and Concentrations of Engineered Nanomaterial in the Environment

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Risks, Release and Concentrations of Engineered Nanomaterial in the Environment
Risks, Release and Concentrations of Engineered Nanomaterial in the Environment
Journal Article

Risks, Release and Concentrations of Engineered Nanomaterial in the Environment

2018
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Overview
For frequently used engineered nanomaterials (ENMs) CeO 2 -, SiO 2 -, and Ag, past, current, and future use and environmental release are investigated. Considering an extended period (1950 to 2050), we assess ENMs released through commercial activity as well as found in natural and technical settings. Temporal dynamics, including shifts in release due to ENM product application, stock (delayed use), and subsequent end-of-life product treatment were taken into account. We distinguish predicted concentrations originating in ENM use phase and those originating from end-of-life release. Furthermore, we compare Ag- and CeO 2 -ENM predictions with existing measurements. The correlations and limitations of the model, and the analytic validity of our approach are discussed in the context of massive use of assumptive model data and high uncertainty on the colloidal material captured by the measurements. Predictions for freshwater CeO 2 -ENMs range from 1 pg/l (2017) to a few hundred ng/l (2050). Relative to CeO 2 , the SiO 2 -ENMs estimates are approximately 1,000 times higher, and those for Ag-ENMs 10 times lower. For most environmental compartments, ENM pose relatively low risk; however, organisms residing near ENM ‘point sources’ (e.g., production plant outfalls and waste treatment plants), which are not considered in the present work, may be at increased risk.