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Comparison study on the size and phase control of nanocrystalline TiO sub(2) in three Ti-Si oxide structures
Comparison study on the size and phase control of nanocrystalline TiO sub(2) in three Ti-Si oxide structures
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Comparison study on the size and phase control of nanocrystalline TiO sub(2) in three Ti-Si oxide structures
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Comparison study on the size and phase control of nanocrystalline TiO sub(2) in three Ti-Si oxide structures
Comparison study on the size and phase control of nanocrystalline TiO sub(2) in three Ti-Si oxide structures

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Comparison study on the size and phase control of nanocrystalline TiO sub(2) in three Ti-Si oxide structures
Comparison study on the size and phase control of nanocrystalline TiO sub(2) in three Ti-Si oxide structures
Journal Article

Comparison study on the size and phase control of nanocrystalline TiO sub(2) in three Ti-Si oxide structures

2008
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Overview
Three types of Ti-Si binary oxides have been prepared by sol-gel processes. The effects of SiO sub(2) addition and annealing temperature on the grain size, phase transition, dispersion, and microstructure of nanocrystalline (nc) TiO sub(2) anatase in the three Ti-Si oxide structures have been comparatively investigated by X-ray diffraction (XRD) analysis and high-resolution transmission electron microscopy (HRTEM). The grain growth and anatase-rutile transformation (ART) of ncTiO sub(2) were found to depend not only on the SiO sub(2) content and annealing temperature, but also on the composite structure. Both the grain growth and the ART of ncTiO sub(2) proved to be significantly inhibited with increasing SiO sub(2) content for all of the Ti-Si samples, but the structure of intimately mixed Ti-Si binary oxide showed the best inhibiting ability under high-temperature annealing. This result might be attributed to variations in the large lattice strains in ncTiO sub(2), which were mainly induced by the substitution of Ti super(4+) by Si super(4+). Plausible mechanisms for the grain growth and ART of ncTiO sub(2) are proposed. To inhibit the grain growth of ncTiO sub(2), the addition of 10 and 30 mol% SiO sub(2) proved to be optimal for Ti-Si samples annealed at 773 K and 1273 K, respectively.

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