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Negative bias temperature instability in strain-engineered p-MOSFETs: a simulation study
by
Maiti, Tapas Kumar
, Maiti, Chinmay Kumar
, Chakraborty, Pinaki
, Mahato, Satya Sopan
, Sarkar, Subir Kumar
in
Analog circuits
/ Applied sciences
/ Bias
/ Circuit properties
/ Computer simulation
/ Design. Technologies. Operation analysis. Testing
/ Devices
/ Electric, optical and optoelectronic circuits
/ Electrical Engineering
/ Electronic circuits
/ Electronics
/ Engineering
/ Exact sciences and technology
/ Instability
/ Integrated circuits
/ LF noise
/ Mathematical and Computational Engineering
/ Mathematical and Computational Physics
/ Mechanical Engineering
/ MOSFETs
/ Niobium base alloys
/ Optical and Electronic Materials
/ Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
/ Stability
/ Strain
/ Theoretical
/ Transistors
2010
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Negative bias temperature instability in strain-engineered p-MOSFETs: a simulation study
by
Maiti, Tapas Kumar
, Maiti, Chinmay Kumar
, Chakraborty, Pinaki
, Mahato, Satya Sopan
, Sarkar, Subir Kumar
in
Analog circuits
/ Applied sciences
/ Bias
/ Circuit properties
/ Computer simulation
/ Design. Technologies. Operation analysis. Testing
/ Devices
/ Electric, optical and optoelectronic circuits
/ Electrical Engineering
/ Electronic circuits
/ Electronics
/ Engineering
/ Exact sciences and technology
/ Instability
/ Integrated circuits
/ LF noise
/ Mathematical and Computational Engineering
/ Mathematical and Computational Physics
/ Mechanical Engineering
/ MOSFETs
/ Niobium base alloys
/ Optical and Electronic Materials
/ Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
/ Stability
/ Strain
/ Theoretical
/ Transistors
2010
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Negative bias temperature instability in strain-engineered p-MOSFETs: a simulation study
by
Maiti, Tapas Kumar
, Maiti, Chinmay Kumar
, Chakraborty, Pinaki
, Mahato, Satya Sopan
, Sarkar, Subir Kumar
in
Analog circuits
/ Applied sciences
/ Bias
/ Circuit properties
/ Computer simulation
/ Design. Technologies. Operation analysis. Testing
/ Devices
/ Electric, optical and optoelectronic circuits
/ Electrical Engineering
/ Electronic circuits
/ Electronics
/ Engineering
/ Exact sciences and technology
/ Instability
/ Integrated circuits
/ LF noise
/ Mathematical and Computational Engineering
/ Mathematical and Computational Physics
/ Mechanical Engineering
/ MOSFETs
/ Niobium base alloys
/ Optical and Electronic Materials
/ Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
/ Stability
/ Strain
/ Theoretical
/ Transistors
2010
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Negative bias temperature instability in strain-engineered p-MOSFETs: a simulation study
Journal Article
Negative bias temperature instability in strain-engineered p-MOSFETs: a simulation study
2010
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Overview
Negative Bias Temperature Instability (NBTI) in p-MOSFETs is a serious reliability concern for digital and analog CMOS circuit applications. Strain in the channel region affects negative bias temperature instabilities, low frequency noise, radiation hardness, gate oxide quality and hot carrier performance. The understanding of these phenomena in strain-engineered p-MOSFETs from fundamental physics is essential. In this paper, technology CAD (TCAD) has been used to study the effects of strain on the negative bias temperature instabilities in p-MOSFETs. A quasi two dimensional (quasi-2D) physics-based Coulomb scattering mobility model for strained-Si has been developed and implemented in Synopsys Sentaurus Device tool for device simulation to understand NBTI in strain-engineered p-MOSFETs.
Publisher
Springer US,Springer,Springer Nature B.V
Subject
/ Bias
/ Design. Technologies. Operation analysis. Testing
/ Devices
/ Electric, optical and optoelectronic circuits
/ Exact sciences and technology
/ LF noise
/ Mathematical and Computational Engineering
/ Mathematical and Computational Physics
/ MOSFETs
/ Optical and Electronic Materials
/ Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
/ Strain
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